Method for manufacturing PDMS flexible super-hydrophobic film

A production method and super-hydrophobic technology, applied in the manufacture of microstructure devices, techniques for producing decorative surface effects, decorative arts, etc., can solve the problems of development, expensive equipment, and high cost, and achieve reduced production costs and good hydrophobic properties , the effect of low surface energy

Inactive Publication Date: 2018-08-14
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

These methods use expensive equipment and high cost, so they cannot develop in the direction of mass production and deviceization
Or random nanostructures are difficult to control and difficult to meet many practical requirements
At the same time, these methods mostly use hard materials to prepare superhydrophobic surfaces, which are difficult to adapt to the complex use environment requirements.

Method used

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  • Method for manufacturing PDMS flexible super-hydrophobic film
  • Method for manufacturing PDMS flexible super-hydrophobic film

Examples

Experimental program
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Effect test

Embodiment 1

[0030] Example 1. Preparation of a PDMS flexible superhydrophobic film with an Under cut structure size of 10 μm and a thickness of 100-150 μm

[0031] a. Clean silicon wafer

[0032] Use acetone, isopropanol and deionized water in sequence to ultrasonically clean the silicon wafer, and then dry it to obtain a clean silicon wafer;

[0033] b. Preparation of single-layer photoresist substrate

[0034] Spin-coat LOR photoresist on the surface of a clean silicon wafer with a spin-coating thickness of 5 μm, then bake at 200°C for 10 minutes, and then cool to room temperature to form a single-layer photoresist substrate; wherein, the initial spin-coating speed is 500rpm and lasts 10s , and then accelerate to 1500rpm for 30s;

[0035] c. Preparation of double-layer photoresist substrate

[0036] Spin-coat SU8-2050 photoresist on the surface of a single-layer photoresist substrate with a spin-coating thickness of 60 μm, then bake at 65°C for 3 minutes, then bake at 90°C for 10 min...

Embodiment 2

[0047] Example 2. Preparation of a PDMS flexible superhydrophobic film with an Under cut structure size of 50 μm

[0048] a. Clean silicon wafer

[0049] Silicon wafers were ultrasonically cleaned with acetone, isopropanol and deionized water in sequence, and then dried to obtain clean silicon wafers;

[0050] b. Preparation of single-layer photoresist substrate

[0051] Spin-coat LOR photoresist on the surface of a clean silicon wafer with a spin-coating thickness of 3 μm, then bake at 170°C for 10 minutes, and then cool to room temperature to form a single-layer photoresist substrate; where the initial spin-coating speed is 500rpm and lasts for 10s , and then accelerate to 2000rpm for 30s;

[0052] c. Preparation of double-layer photoresist substrate

[0053] Spin-coat SU8-2050 photoresist on the surface of a single-layer photoresist substrate with a spin-coating thickness of 40 μm, then bake at 65°C for 3 minutes, then bake at 90°C for 10 minutes, and finally cool to roo...

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Abstract

The invention discloses a method for manufacturing a PDMS flexible super-hydrophobic film. A duplication template composed of double-layer rubber and provided with an undercut structure is prepared byusing the MEMS technology, and a super-hydrophobic structure is formed on the surface of a flexible material such as PDMS or the like on the basis of the template by using a flexible replication process so as to prepare the PDMS flexible super-hydrophobic film. The method disclosed by the invention is simple to operate, low in manufacturing cost and high in efficiency, and no harsh equipment is needed, thereby being conducive to realizing low-cost mass production.

Description

technical field [0001] The invention relates to a method for manufacturing a PDMS flexible super-hydrophobic film, and more specifically relates to a method for manufacturing a PDMS flexible super-hydrophobic film by using an inverted structure template and a flexible replication process, and belongs to the technical field of micro-nano structure manufacturing. Background technique [0002] In recent years, the application research of superhydrophobic materials has become an attractive frontier field. A superhydrophobic surface is generally defined as a surface where the contact angle between water and the surface is greater than 150° and the sliding angle is less than 20°. Due to the excellent superfluidity and self-cleaning properties of the fluid on this surface, the use of superhydrophobic materials can achieve: reducing the adhesion of various dust, ice and snow, and particles on walls, glass, outdoor equipment, and automobile surfaces; preventing radar, The signal att...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
CPCB81C1/00158B81C1/00349
Inventor 李小军黄一航吴晓冬陈文韬张书源
Owner HEFEI UNIV OF TECH
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