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Ultra-fast silicon-based surface quality detection system

A surface quality and detection system technology, which is applied in the direction of measuring devices, optical testing of flaws/defects, and material analysis through optical means, can solve problems such as limited cost speed, silicon crystal surface quality detection obstacles, etc., and achieve non-loss detection Accuracy, speed-up effects

Inactive Publication Date: 2018-08-24
SUN YAT SEN UNIV
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Problems solved by technology

At present, there are many methods for silicon-based surface quality detection technology, but most of them are limited by their cost and speed, which makes it an obstacle to apply large-scale silicon surface quality detection in industry

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  • Ultra-fast silicon-based surface quality detection system

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Embodiment Construction

[0013] The accompanying drawings are for illustrative purposes only, and should not be construed as limitations on this patent; in order to better illustrate this embodiment, certain components in the accompanying drawings will be omitted, enlarged or reduced, and do not represent the size of the actual product; for those skilled in the art It is understandable that some well-known structures and descriptions thereof may be omitted in the drawings. The positional relationship described in the drawings is for illustrative purposes only, and should not be construed as a limitation on this patent.

[0014] Such as figure 1 As shown, an ultra-fast silicon-based surface quality detection system includes a mode-locked femtosecond pulse light source 1, a mid-infrared light wave filter 2, a dispersion fiber 3, an erbium-doped fiber amplifier 4, and a diffraction grating 9, based on a lens composition 4f imaging system, objective lens 11, digital coherent receiver 13, high-speed sampl...

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Abstract

The invention relates to the technical field of silicon-based surface quality detection, in particular to an ultra-fast silicon-based surface quality detection system. The system the following devices: a mode-locked femtosecond pulse light source, a mid-infrared optical filter, a dispersion optical fiber, an erbium-doped fiber amplifier (EDFA), a diffraction grating, a 4f imaging system based on alens, an objective lens, a digital coherent receiver, a high-speed sampling oscilloscope and a computer required for data processing and recovery. The system further comprises a circulator, a coupler, an optical fiber, an optical fiber polarization controller, a collimator, and the like which are needed to be used.

Description

technical field [0001] The invention relates to the technical field of silicon-based surface quality detection, and more particularly relates to an ultra-fast silicon-based surface quality detection system. Background technique [0002] Silicon semiconductor material is currently a very critical building block material in many industries today. Silicon semiconductors play an important role in the development of industries such as clean energy and military industry. At present, more than 90% of semiconductor devices in the world are made of silicon materials. In the past few years, the silicon industry has been growing at a rate of more than ten percent per year. Single crystal silicon polished wafers have been widely used in the manufacture of various discrete components; the manufacturing process of silicon is very complicated, due to the imperfection of the industrial process and defects in various processing, it is easy to form defects on the surface of silicon, so that...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/95
CPCG01N21/9501
Inventor 李朝晖王绍祥冯元华甄智燊吴振华
Owner SUN YAT SEN UNIV
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