Method for manufacturing light emitting diode chip and light emitting diode chip
A technology of light-emitting diodes and manufacturing methods, applied to the manufacture of light-emitting diode chips and the field of light-emitting diode chips, capable of solving problems such as inability to obtain sufficient brightness, and achieving the effect of improving brightness
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[0024] Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings. refer to figure 1 , shows a front perspective view of an optical device wafer (hereinafter, sometimes simply referred to as a wafer) 11 .
[0025] The optical device wafer 11 is formed by laminating an epitaxial layer (laminate layer) 15 such as gallium nitride (GaN) on a sapphire substrate 13 . The optical device wafer 11 has a front surface 11 a on which the epitaxial layer 15 is laminated and a back surface 11 b exposed from the sapphire substrate 13 .
[0026] Here, in the optical device wafer 11 of the present embodiment, the sapphire substrate 13 is used as the crystal growth substrate, but a GaN substrate, a SiC substrate, or the like may be used instead of the sapphire substrate 13 .
[0027] The stacked body layer (epitaxial layer) 15 is formed by making electrons a majority carrier of the n-type semiconductor layer (for example, an n-type GaN layer),...
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