Ultrapure water production apparatus and method for operating ultrapure water production apparatus
A technology for manufacturing devices and operating methods, applied in separation methods, water/sewage treatment, chemical instruments and methods, etc., can solve problems such as insufficient water pressure, inability to ensure water quality stability, unstable treatment, etc., and achieve the effect of efficient replacement
Pending Publication Date: 2018-09-28
KURITA WATER INDUSTRIES LTD
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Problems solved by technology
In addition, considering the pressure resistance of the electrodeionization device, the supply pressure to the water to be treated cannot be set higher, and since the discharge pressure of the treated water is smaller than the supply pressure, the electrodeionization device in the latter stage The treatment becomes unstable, so not only the stability of the water quality cannot be ensured, but also there is a problem that the water pressure required to supply the ultrapure water to the water point is insufficient
Method used
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Embodiment 1
[0065] City water (water to be treated) W in Yoshida Town, Habara-gun, Shizuoka Prefecture was treated using a primary pure water system 2 composed of a reverse osmosis (RO) membrane (RO) device 4 and a regenerative mixed-bed ion exchange device 5 . The boron concentration of this primary pure water W1 is measured with a boron monitor 6 , and treated with an electrodeionization device 7 , and the treated water W2 is stored in a sub-tank 8 . The sub-tank 8 is connected to the sub-tank 8 through a sub-system 3 equipped with a UV oxidation device 9, an anion exchange resin device 12, a degassing membrane 13, a non-regenerative mixed-bed ion exchange device 10, and an ultrafiltration membrane (UF membrane) 11 in sequence. The treated water W2 inside is treated to produce secondary pure water W5.
[0066] In addition, the following devices were used as the electrodeionization device 7 .
[0067] Electrodeionization device: KCDI-UPz manufactured by Kurita Kogyo Co., Ltd. The desali...
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An ultrapure water production apparatus 1 is provided with a primary pure water system 2 and a subsystem 3. The primary pure water system 2 comprises a reverse osmosis membrane (RO) device 4 and a regenerating mixed bed-type ion exchange device 5, and after said regenerating mixed bed-type ion exchange device 5, is provided with a boron monitor 6 as a boron concentration-measuring means and an electric deionization device 7. The subsystem 3 comprises a UV oxidation device 9, a non-regenerating mixed bed-type ion exchange device 10, and an ultrafiltration membrane 11. The boron concentration ofprimary pure water W1 is continuously monitored by the boron monitor 6, and assuming that the product of the boron concentration [B] of the primary pure water W1 and the boron removal rate of the electric deionization device 7 is the boron concentration [B1] of the treated water W2, the boron concentration of water supplied to the subsystem 3 is continuously monitored. With such an ultrapure water production apparatus 1, it is possible to efficiently remove boron and promptly prevent leaking thereof.
Description
technical field [0001] The present invention relates to an ultrapure water production device for producing ultrapure water used in electronic industries such as semiconductors and liquid crystals, and an operating method of the ultrapure water production device. In particular, it relates to an ultrapure water production device capable of preventing boron leakage by effectively removing boron, and an operation method thereof. Background technique [0002] In the prior art, the ultrapure water used in the electronics industry such as semiconductors is produced by treating raw water through an ultrapure water manufacturing device. The ultrapure water manufacturing device consists of a pretreatment system, a primary pure water system and a primary pure water treatment subsystem composition. [0003] In this ultrapure water production device, the pretreatment system is composed of coagulation, pressurized flotation (sedimentation), filtration (membrane filtration) devices, etc.,...
Claims
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Patent Timeline
Login to View More IPC IPC(8): C02F9/06B01D61/48B01D61/52B01D61/54B01D61/58C02F1/42C02F1/44C02F1/469C02F9/08
CPCB01D61/48B01D61/52B01D61/54B01D61/58C02F1/42C02F1/44C02F1/469Y02A20/124B01D61/145C02F1/444C02F1/4695C02F2103/04
Inventor佐藤伸
OwnerKURITA WATER INDUSTRIES LTD