Method for preparing copper gallium germanium film by using chloride system
A chloride, copper gallium technology, applied in the field of photoelectric thin film preparation for solar cells, can solve the problems of high preparation cost and complex process route, and achieve the effects of low production cost, low equipment requirements and high production efficiency
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[0033] a. Cleaning of glass substrate or silicon substrate: clean the substrate as described above, the size of which is 20mm×20mm×2mm.
[0034] b. 2.0 parts of TeO can be added first 2 Put into 30-120 parts of solvent, wherein the solvent is hydrochloric acid. After its complete reaction, 1.0 parts of CuCl 2 , 1.7 parts GaCl 3 Put in, so that the substances in the solution are evenly mixed.
[0035] c. Drop the above solution onto the glass substrate placed on the homogenizer, and then start the homogenizer. The homogenizer rotates at 200 rpm for 5 seconds and at 3000 rpm for 15 seconds, so that the dripped solution is coated After the cloth is evenly distributed, the substrate is dried, and then the above-mentioned solution is repeatedly dripped and spin-coated, and then dried again. This is repeated 6 times, and a precursor thin film sample with a certain thickness is obtained on the substrate.
[0036] d. Place the precursor thin film sample obtained in step c on a sup...
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