Vacuum plating sterilization film
A technology of vacuum plating and sterilization layer, applied in vacuum evaporation plating, sputtering plating, ion implantation plating, etc., can solve the problems of low efficiency, strong dependence, side effects of organic sterilization materials, etc., and achieve a wide range of sterilization, The sterilization speed is fast and the effect of increasing the sterilization range
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[0025] Example 1
[0026] Such as figure 1 As shown, the manufacturing method of vacuum plating sterilization film includes the following steps: using ion plating method to deposit Ti on a stainless steel substrate as a spacer layer, the thickness of the spacer layer is 0.1μm, and then using the method of magnetron sputtering BiCuSe 3 It is deposited on the spacer layer as a sterilization layer. The thickness of the sterilization layer is 20 nm. Finally, Al is deposited on the sterilization layer as a protective layer by magnetron sputtering, and the thickness of the protective layer is 0.1 μm.
[0027] Preparation of spacer layer: using ion plating method, Ti film is deposited by multi-arc ion plating, the sample starts to deposit Ti after Ar ion sputtering cleaning in the coating chamber for 5 minutes, the target material is titanium dioxide target, the purity is 99.99%, the target chamber is vacuum Degree 3.2×10 -1 Pa. Coating process parameter is N 2 Flow 3.2×10 -5 m 3 min -1 ...
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[0034] Example 2
[0035] Such as figure 1 As shown, the manufacturing method of the vacuum plating sterilization film includes the following steps: Ni is deposited on the aluminum alloy substrate by ion plating as a spacer layer, the thickness of the spacer layer is 0.5μm, and then the BiAgSe is deposited by magnetron sputtering. 3 It is deposited on the spacer layer as a sterilization layer. The thickness of the sterilization layer is 200 nm. Finally, Ni is deposited on the sterilization layer as a protective layer by magnetron sputtering, and the thickness of the protective layer is 0.5 μm.
[0036] Preparation of sterilization layer: BiAgSe 3 Prepared by magnetron sputtering, the target material for magnetron sputtering is BiAgSe 3 , The purity is 99.99%. In the experiment, Ar gas was used as the sputtering gas, and an appropriate amount of oxygen was introduced, and the sputtering was performed after the current and voltage were sufficiently stabilized. The working pressure d...
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[0042] Example 3
[0043] Such as figure 1 As shown, the manufacturing method of vacuum plating sterilization film includes the following steps: using ion plating method to deposit Al on the copper substrate as a spacer layer, the thickness of the spacer layer is 1μm, and then using magnetron sputtering method to BiAgSe 3 It is deposited on the spacer layer as a sterilization layer, the thickness of the sterilization layer is 500 nm, and finally Ti is deposited on the sterilization layer as a protective layer by magnetron sputtering, and the thickness of the protective layer is 1 μm.
[0044] Preparation of sterilization layer: BiAgSe 3 Prepared by magnetron sputtering, the target material for magnetron sputtering is BiAgSe 3 , The purity is 99.99%. In the experiment, Ar gas was used as the sputtering gas, and an appropriate amount of oxygen was introduced, and the sputtering was performed after the current and voltage were sufficiently stabilized. The working pressure during sput...
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