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Mask aligner for chip production

A chip and workbench technology, applied in the direction of optomechanical equipment, microlithography exposure equipment, optics, etc., can solve the problems of inconvenient dust handling and inconvenient detection of lithography quality, so as to improve the comfort of use and save processing procedures time and improve work efficiency

Active Publication Date: 2018-11-23
深圳市克拉尼声学科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the traditional lithography machine for chip production is inconvenient to deal with the dust after the lithography chip is completed, and it is inconvenient to check the lithography quality after use

Method used

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  • Mask aligner for chip production
  • Mask aligner for chip production
  • Mask aligner for chip production

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Embodiment Construction

[0025] In order to make the technical means, creative features, goals and effects achieved by the present invention easy to understand, the present invention will be further described below in conjunction with specific embodiments.

[0026] Such as figure 1 and image 3 As shown, a photolithography machine for chip production according to the present invention includes a base plate 1, a height adjustment structure 3, a workbench 4, a detection structure 6, an LED lamp 7, a dust accumulation structure 8 and a vacuum pump 9; the base plate 1 The height adjustment structure 3 for adjusting the height is provided between the workbench 4 for placing chips, and the height adjustment structure 3 is detachably connected to the workbench 4; the internal design of the workbench 4 There is the vacuum pump 9 that provides negative pressure; the LED light 7 for detecting chips and the detection structure 6 for placing chips are arranged on the workbench 4, and the detection structure 6 an...

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Abstract

The invention relates to the field of chip production equipment, in particular to a mask aligner for chip production. The mask aligner comprises a bottom plate, a height adjusting structure, a workbench, detection structures, LED lamps, dust accumulation structures and vacuum pumps; the height adjusting structure for adjusting the height is arranged between the bottom plate and the workbench usedfor placing a chip; the vacuum pumps for providing negative pressure are arranged in the workbench; the workbench is provided with the LED lamps used for detecting the chips and the detection structures used for placing the chips; and the dust accumulation structures used for containing dust are arranged at the bottom end of the workbench. The vacuum pumps are matched with the detection structures, so that the internal negative pressure of the dust accumulation structures is realized, and dust and sweeps on the chips on the detection structures can be conveniently pressed into the interiors ofthe dust accumulation structures; therefore, the dust after photoetching can be conveniently and quickly processed; and the LED lamps arranged on the workbench are matched with the detection structures, so that the photo-etched chips can be detected while dust is cleaned, thereby shortening the time of machining procedures and highly improving working efficiency.

Description

technical field [0001] The invention relates to the field of chip production equipment, in particular to a photolithography machine for chip production. Background technique [0002] Photolithography machine (Mask Aligner) is also known as: mask alignment exposure machine, exposure system, photolithography system, etc. The commonly used lithography machine is mask alignment lithography. The general lithography process has to go through the surface cleaning and drying of silicon wafers, primer coating, spin-coating photoresist, soft baking, alignment exposure, post-baking, development, and hard baking. , etching and other processes, after the chip photolithography processing, it is necessary to remove the dust of the chip in time and check the quality of the photolithography. [0003] However, the traditional lithography machine for chip production is inconvenient to deal with the dust after the lithography chip is completed, and it is inconvenient to check the lithography q...

Claims

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Application Information

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IPC IPC(8): G03F7/20
CPCG03F7/70716G03F7/70908
Inventor 陈涛
Owner 深圳市克拉尼声学科技有限公司