Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel culture substrate

A cultivation substrate and substrate technology, applied in planting substrate, culture medium, horticulture, etc., can solve the problems of low yield, insufficient utilization rate, impact on crop yield and quality, etc., and achieve low price and ease the pressure on resources and the environment Effect

Pending Publication Date: 2018-11-30
CANGZHOU ACAD OF AGRI & FORESTRY SCI +1
View PDF4 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although corn stalks are widely used, the actual utilization rate is less than half
[0007] Although crop straw contains a large amount of organic matter and trace elements for plant growth, and is easy to obtain and low in price, it is a rare raw material for cultivation substrate, and it is also used as a source of cultivation substrate in practice, but crop straw is in the There are still some problems to be solved in terms of substrate utilization. For example, the main method of developing corn stalks as a cultivation substrate is to mix straw with traditional organic fertilizers such as chicken manure, manure (cattle and sheep manure, etc.), and then add some auxiliary materials for crop cultivation. Cultivation and production can be popularized, but there are also serious problems, mainly because most of this type of substrate has short nutrient duration, long seedling slowing time, insufficient attention to plant root development, and low yield.
In addition, raw materials such as chicken manure, cattle and sheep manure, etc. will leave a large amount of antibiotics, salt ions and other substances in the production process, which will seriously affect the yield and quality of crops.
Moreover, these organic fertilizers need to go through a strict fermentation process before use. If they are not fully decomposed, they will cause fatal damage to the crops produced.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel culture substrate
  • Novel culture substrate
  • Novel culture substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] The composition is prepared by mixing uniformly the dung of beetle larvae, corn stalks and vermiculite, and sterilizing at 121°C for 30 minutes. Among them, the volume content of insect droppings is 2%, the volume content of corn stalks is 85%, and the volume content of vermiculite is 13%.

Embodiment 2

[0048] The composition is prepared by mixing uniformly the dung of beetle larvae, corn stalks and vermiculite, and sterilizing at 121°C for 30 minutes. Among them, the volume content of insect droppings is 5%, the volume content of corn stalks is 85%, and the volume content of vermiculite is 10%.

Embodiment 3

[0050] The composition is prepared by mixing uniformly the dung of beetle larvae, corn stalks and vermiculite, and sterilizing at 121°C for 30 minutes. Among them, the volume content of insect droppings is 10%, the volume content of corn stalks is 70%, and the volume content of vermiculite is 20%.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a culture substrate, which is prepared from insect mature generated by insects and organic matters; particularly, the organic matter includes decomposed crop stalks and / or coconut husk; preferably, the crop straws include corn stalks and / or wheat stalks. In the culture substrate, the insect mature and the decomposed crop stalks can achieve a cooperated effect on the growthof the crops, so that the technical problems of short nutrient effect duration period, long seedling restoration time, poor plant root system development, low yield and the like due to utilization ofcrop stalk utilization in the prior art can be solved.

Description

technical field [0001] The invention relates to a novel cultivation substrate. Background technique [0002] In modern agricultural production, soilless cultivation technology has been more and more widely used. Soilless cultivation can effectively cut off the transmission of disease sources and insect sources, avoid continuous cropping obstacles, save water and fertilizer, and are not restricted by the environment and site, etc. advantage. At the same time, the agricultural products produced by soilless cultivation are more in line with the standard of green food. [0003] Soilless cultivation technology originated in Europe and the United States. With the development of agricultural technology and the increasingly prominent problems of soil salinization, continuous cropping obstacles, and land resource shortages in my country, soilless cultivation technology in China has begun to rise. The difference lies in the choice of substrate types. In general, European and American...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): A01G24/20A01G24/22A01G24/25A01G24/15
CPCA01G24/15A01G24/20A01G24/22A01G24/25
Inventor 赖德强刘春琴刘福顺吴娱冯晓洁张悦束长龙王庆雷
Owner CANGZHOU ACAD OF AGRI & FORESTRY SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products