Low-cost medicine coating method
A low-cost, pharmaceutical technology, applied in pharmaceutical formulations, non-active medical preparations, inorganic non-active ingredients, etc., can solve the problems of inability to accurately control the sustained release time of drugs, high processing costs, and uneven coating, etc. To achieve the effect of improving the shelf life of the drug
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Embodiment 1
[0031] The present embodiment provides a low-cost drug coating method, which specifically includes the following steps:
[0032] 1) Deposit a coating layer on the solid particle drug by ALD method to obtain ALD-coated modified drug.
[0033] The specific operation process of the ALD method is as follows: First, put the drug particles into a porous container with micropore size, put the porous container into the reaction chamber, vacuumize and replace the nitrogen three times, the temperature of the reaction chamber is raised to 50°C, and the reaction chamber maintains At a pressure of 5 torr, the porous container is rotated again so that the drug particles are fully mixed in the cavity of the porous container; then, the precursor Al(CH 3 ) 3 N at 15 sccm flow rate 2 Carry the lower pulse into the reaction chamber, adsorb on the drug particles, the pulse time is 10s, and then use 1000sccmN 2 Purge and take away the remaining Al(CH 3 ) 3 , N 2 The flushing time is 10s, the...
Embodiment 2
[0048] The present embodiment provides a low-cost drug coating method, which specifically includes the following steps:
[0049] 1) Deposit a coating layer on the solid particle drug by ALD method to obtain ALD-coated modified drug.
[0050] The specific operation process of the ALD method is as follows: First, put the drug particles into a porous container with micropore size, put the porous container into the reaction chamber, vacuumize and replace the nitrogen three times, the temperature of the reaction chamber is raised to 50 °C, and the nitrogen flow is used. The method is to make the powder suspended and fully mixed in the porous cavity, and the nitrogen flow rate is 5000 sccm; then, the precursor TiCl for atomic layer deposition 4 N at 30sccm flow rate 2 Carried by the pulse into the reaction chamber, adsorbed on the drug particles, the pulse time is 60s, until the air pressure reaches 6torr, and then with 500sccm N 2 Purge and take away remaining TiCl 4 , N 2 The ...
Embodiment 3
[0056] The present embodiment provides a low-cost drug coating method, which specifically includes the following steps:
[0057] 1) Deposit a coating layer on the solid particle drug by ALD method to obtain ALD-coated modified drug.
[0058] The specific operation process of the ALD method is as follows: First, put the drug particles into a porous container with micropore size, put the porous container into the reaction chamber, vacuumize and replace the nitrogen three times, the temperature of the reaction chamber is raised to 150°C, and the reaction chamber maintains At the pressure of 5torr, rotate the porous container again, so that the drug particles are fully mixed in the porous container cavity; then, the precursor Zr[N(CH3) used for atomic layer deposition 2 ] 4 N at 50sccm flow rate 2 Carry the lower pulse into the reaction chamber, adsorb on the drug particles, the pulse time is 60s, until the air pressure reaches 6torr, and then use 50sccm N 2 Purge and take away...
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Abstract
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