Fullerene-containing repairing nutrition mask as well as preparation method and application method thereof

A fullerene and nutritional technology, applied in skin care preparations, pharmaceutical formulas, cosmetic preparations, etc., can solve the problems of non-sustained release, multiple side effects, poor adhesion of membrane cloth, etc., and achieve the effect of promoting metabolism
CN108969435AInactive Publication Date: 2018-12-11苏州火睿新材料科技有限公司

Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
苏州火睿新材料科技有限公司
Publication Date
2018-12-11
Estimated Expiration
Not applicable · inactive patent
Patent Text Reader

Abstract

The invention discloses a fullerene-containing repairing nutrition mask, which is a dry film with thickness of 0.1 to 1mm obtained by spreading and smearing a mask liquid on a hole net and drying, andthe mask liquid is prepared from the following components by weight percent: 0.5%-40% of polysaccharide, 0.5%-20% of polyvinyl alcohol, 0.001%-5% of fullerene, 0.3%-30% of PVP, 0.02%-10% of plant extract, 0.05%-30% of fungal extract, 0.05%-3% of hyaluronic acid, 0.2%-5% of squalane and squalene, 0.05%-5% of peptide, 0.05%-3% of glucose, 0.05%-1% of plant essential oil and the balance of water. The invention also provides a preparation method and an application method for the fullerene-containing repairing nutrition mask. The fullerene-containing repairing nutrition mask has multiple functionsof polysaccharide, fullerene, etc., can exert the effects of each added component to the greatest degree, and has significant functions in repairing and nourishing skin, absorbing free radicals, resisting oxidation, promoting metabolism of skin cells, resisting aging, etc.
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Description

technical field

[0001] The invention relates to the technical field of cosmetics, in particular to a repairing nutritional facial mask containing fullerene, as well as its preparation method and application method. Background technique

[0002] Mask is a common and portable skin care product, which can clean and repair the face. It is applied or applied on the surface of the facial skin to isolate the skin from the outside air and increase the temperature of the skin, so that the nutrients attached to the mask can penetrate into the skin and improve skin function. Existing facial mask is basically the membrane cloth that materials such as paper, cotton linen, polyester are made and the essence liquid that formula is different forms. Due to the shortcomings of the current membrane cloth, such as poor fit, poor water holding capacity, poor biocompatibility, no slow release, and troublesome use, the effect of the mask is average. In addition, most of the essence contains pres...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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