Yttrium hydroxide photochromic and thermochromic multilayer film material capable of achieving fast fading

A multi-layer thin film and yttrium hydride technology, which is applied in metal material coating process, coating, vacuum evaporation plating, etc., can solve the problems of low solar energy regulation rate, poor weather resistance, low decolorization rate, etc., and achieve the film-making step Simple, inexpensive, low energy consumption effect

Inactive Publication Date: 2018-12-28
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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Problems solved by technology

[0014] Aiming at the problems of discoloration, low decolorization rate, low solar regulation rate and poor weather resistance in the yttrium oxyhydride thin film material, the purpose of the present invention is to provide a photothermochromic multilayer film of yttrium oxyhydride that can quickly fade Materials and their preparation methods and applications

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  • Yttrium hydroxide photochromic and thermochromic multilayer film material capable of achieving fast fading
  • Yttrium hydroxide photochromic and thermochromic multilayer film material capable of achieving fast fading
  • Yttrium hydroxide photochromic and thermochromic multilayer film material capable of achieving fast fading

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preparation example Construction

[0048] Preparation of Dimming Layer Containing Yttrium Oxyhydride. Wherein, the target material of the dimming layer containing yttrium oxyhydride may be metal yttrium or yttrium hydride. Using DC magnetron sputtering technology or AC magnetron sputtering technology to prepare the oxygen-containing yttrium hydride dimming layer on the surface of the FTO electric heating layer.

[0049] In one embodiment of the present invention, using metal yttrium as the target material, the parameters for preparing the dimmer layer containing yttrium oxyhydride by DC magnetron sputtering technology include: background vacuum-5 Pa, mixed atmosphere of argon and hydrogen, substrate temperature 25°C-300°C, substrate speed 5-15 rpm, sputtering power 30-100W, sputtering time 10-100min, working pressure 0.3Pa-2Pa. Wherein, the flow rate of the argon gas may be 20-50 sccm, and the flow rate of the hydrogen gas may be 5-20 sccm. Further, the volume ratio of argon and hydrogen may be (1-25):1, prefe...

Embodiment 1

[0061] Example 1 Preparation of photothermochromic multilayer film containing yttrium oxyhydride

[0062] 1) Cleaning of the substrate:

[0063] Put the FTO substrate (manufacturer: Kaivo; model: FTO-003) in a beaker, ultrasonically treat it in deionized water, ethanol, and deionized water for 10 minutes, and then use pH test paper to confirm that the final washing solution is neutral;

[0064] 2) Preparation of photothermochromic multilayer films

[0065] Method 1: The magnetron sputtering system adopts the DC current magnetron sputtering method. The vacuum system is composed of a molecular pump and a mechanical pump. The background vacuum degree of the vacuum chamber reaches 10 -5 Magnitude. The target components are 2-inch pure yttrium metal, 2-inch pure tungsten metal, and 2-inch silicon targets. After the background vacuum reaches the requirement, put the cleaned substrate into the deposition chamber, and then fill the vacuum chamber with high-purity Ar gas and H 2 Ai...

Embodiment 2

[0082] 1) Clean and clean the FTO electric heating layer substrate, the thickness is 400nm;

[0083] 2) Preparation of photothermochromic multilayer films;

[0084] Method 1: The magnetron sputtering system adopts the DC current magnetron sputtering method. The vacuum system is composed of a molecular pump and a mechanical pump. The background vacuum degree of the vacuum chamber reaches 10 -5 Magnitude. The target components were 2 inches of pure yttrium metal and 2 inches of pure tungsten metal. After the background vacuum reaches the requirement, put the cleaned substrate into the deposition chamber, and then fill the vacuum chamber with high-purity Ar gas and H 2 Gas, ratio (3:1), flow rate (35:12). Control the substrate rotation speed to 5r / min. Wait until the pressure of the deposition chamber is stabilized at 0.4-2Pa;

[0085] a) Depositing a Y target material by sputtering, the sputtering parameters are: W(Y)=60W, t(Y)=3000s, to obtain a dimming layer containing yt...

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Abstract

The invention relates to an yttrium hydroxide photochromic and thermochromic multilayer film material capable of achieving fast fading. The yttrium hydroxide photochromic and thermochromic multilayerfilm material capable of achieving fast fading comprises an fluorine-doped tin oxide (FTO) electrothermal layer, a dimming layer containing the yttrium oxide-hydride, a hypoxic tungsten oxide functional layer and a protective layer, wherein the dimming layer containing the yttrium oxide-hydride, the hypoxic tungsten oxide functional layer and the protective layer are formed on the FTO electrothermal layer in sequence.

Description

technical field [0001] The invention relates to an inorganic photochromic and thermochromic multilayer thin film material, a preparation method and application thereof, and belongs to the technical field of intelligent energy-saving glass dimming. Background technique [0002] my country is a big energy consumption country in the world, not only consumes a lot of building energy, but also has a low energy utilization rate. It is estimated that building energy consumption generally accounts for one-third of the total energy consumption of the society. At the same time, the contribution rate of building energy consumption to the world's greenhouse gas emissions is as high as 25%. Emission reduction must prioritize building energy efficiency. Statistics show that 50% of building energy consumption is carried out through glass windows, which are the main channels for light and heat exchange between buildings and the outside world. Therefore, the development of a new type of sm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/08C23C14/35
CPCC23C14/0036C23C14/06C23C14/0676C23C14/083C23C14/352
Inventor 包山虎金平实张启轩李荣
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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