Preparation method of micro-nano structure
A micro-nano structure, one-sided technology, applied in the field of micro-nano, can solve the problems of cumbersome preparation methods of micro-nano structure, unfavorable practical application of micro-nano technology, etc., and achieve the effect of simple method
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[0028] The invention provides a method for preparing a micro-nano structure, comprising the following steps:
[0029] (1) Covering the glass sheet on one side of the metal substrate to obtain the substrate;
[0030] (2) plasma etching is carried out on the side of the glass sheet covered with the substrate obtained in the step (1), and a micro-nano structure is formed on the surface of the glass sheet; the plasma etching gas includes fluorine-containing gas and Ar .
[0031] In the present invention, a glass sheet is partially covered on one side of a metal substrate to obtain a matrix.
[0032] In the present invention, the material of the metal substrate preferably includes stainless steel, aluminum or copper.
[0033] In the present invention, the material of the glass sheet preferably includes one or more of quartz glass, borosilicate glass and radiation-resistant glass.
[0034] In the present invention, the ratio of the area of the metal substrate to the glass sheet...
Embodiment 1
[0045] Place the quartz glass sheet on the metal substrate to form a substrate, place the substrate in the reaction chamber of the plasma etching device, and then pass through CHF 3 and Ar for plasma etching to form micro-nano structures. of which CHF 3 The gas flow rate of Ar is 10 sccm, the gas flow rate of Ar is 50 sccm, the time of plasma etching is 30 min, the pressure of plasma etching is 3Pa, and the power of plasma etching is 500W.
[0046] The scanning electron microscope picture of the micro-nano structure prepared in Example 1 is as follows figure 2 , image 3 and Figure 4 shown, where figure 2 for top view, image 3 for oblique view, Figure 4 for side view. The average height of the micro-nano structure is 528nm, the number is 428, and the total area of the micro-nano structure is 2.182×10 6 nm 2 , The maximum transmittance of the quartz glass sheet is 96.46%, which effectively improves the anti-reflection performance of the quartz glass sheet.
Embodiment 2
[0048] Put BK7 borosilicate glass on the metal substrate to form a matrix, place the matrix in the reaction chamber of the plasma etching device, and then pass it into CHF 3 and Ar for plasma etching to form micro-nano structures. of which CHF 3 The gas flow rate of Ar is 15 sccm, the gas flow rate of Ar is 40 sccm, the time of plasma etching is 30 min, the pressure of plasma etching is 10 Pa, and the power of plasma etching is 200W.
[0049] The scanning electron microscope picture of the micro-nano structure prepared in embodiment 2 is as follows Figure 5 and Image 6 shown, where Figure 5 for top view, Image 6 For oblique view. The average height of the micro-nano structure is 150nm, the number is 836, and the total area of the micro-nano structure is 7.455×10 5 nm 2 , The highest transmittance of BK7 borosilicate glass sheet is 95.13%, which effectively improves the anti-reflection performance of BK7 borosilicate glass sheet.
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Abstract
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