Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method for preparing facial mask base material by using modified antibacterial silks as substrate

A mask and modification technology, applied in the field of skin care products, can solve the problems of residual pollution, easy loss of coating, and unstable silk performance, and achieve good antibacterial properties, not easy to fall off, and good antibacterial and anti-inflammatory effects.

Inactive Publication Date: 2019-01-11
ZHEJIANG SCI-TECH UNIV
View PDF5 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the active solution of silk protein is affected by the outside world, and the general treatment methods cannot perfectly modify silk
Generally speaking, the modification of silk is mainly to directly modify the silk, such as coating titanium dioxide or other components on the surface, but the coating on the surface of the modified silk prepared by this method is easy to lose, which not only causes residual pollution , and the performance of silk is not stable enough

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing facial mask base material by using modified antibacterial silks as substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] A method for preparing a mask base material based on modified antibacterial silk, comprising the steps of:

[0031] 1) put the nano-silver particles with a particle size of 20nm into deionized water, use 20KHz ultrasonic treatment for 10min, and prepare a nano-silver solution with a concentration of 20mg / L;

[0032] 2) the nano-silver solution obtained in step 1) is mixed with part of sucrose, glycerin, and sodium hydroxide to make a nano-silver containing 2% sucrose, 4% glycerol and 2% sodium hydroxide by weight fraction Compounding solution;

[0033] 3) Soak the mulberry leaves for feeding into the nano-silver complex solution obtained in step 2), raise the temperature of the solution to 40°C, use 15KHz ultrasonic treatment for 20min, put the mulberry leaves in a blast drying oven and dry them at 60°C for 2h , to obtain nano silver-containing mulberry leaves;

[0034] 4) Use the N,N'-carbonyldiimidazole solution with a weight fraction of 8%, spray it on the nano-sil...

Embodiment 2

[0038] A method for preparing a mask base material based on modified antibacterial silk, comprising the steps of:

[0039] 1) put the nano-silver particles with a particle size of 25nm into deionized water, use 30KHz ultrasonic treatment for 15min, and prepare a nano-silver solution with a concentration of 50mg / L;

[0040] 2) the nano-silver solution obtained in step 1) is mixed with part of sucrose, glycerin, and sodium hydroxide to make a nano-silver containing 3% sucrose, 5% glycerol and 3% sodium hydroxide by weight fraction Compounding solution;

[0041] 3) Soak the mulberry leaves for feeding into the nano-silver complex solution obtained in step 2), raise the temperature of the solution to 50°C, use 20KHz ultrasonic waves for 25 minutes, and put the mulberry leaves in a blast drying oven to dry at 75°C for 3 hours , to obtain nano silver-containing mulberry leaves;

[0042] 4) use the N, N'-carbonyldiimidazole solution of 10% by weight fraction, spray on the nano-silv...

Embodiment 3

[0046]A method for preparing a mask base material based on modified antibacterial silk, comprising the steps of:

[0047] 1) put the nano-silver particles with a particle size of 21nm into deionized water, use 23KHz ultrasonic treatment for 12min, and prepare a nano-silver solution with a concentration of 30mg / L;

[0048] 2) the nano-silver solution obtained in step 1) is mixed with part of sucrose, glycerin, and sodium hydroxide to make nano-silver containing 2.2% sucrose, 4.2% glycerol and 2.2% sodium hydroxide by weight fraction Compounding solution;

[0049] 3) Soak the mulberry leaves for feeding into the nano-silver complex solution obtained in step 2), raise the temperature of the solution to 42°C, use 17KHz ultrasonic treatment for 22min, and put the mulberry leaves into a blast drying oven to dry at 65°C for 2.3 h, to obtain mulberry leaves containing nano-silver;

[0050] 4) Use the N, N'-carbonyldiimidazole solution with a weight fraction of 9%, spray it on the na...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
concentrationaaaaaaaaaa
particle diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to the technical field of skin-care products, and discloses a method for preparing a facial mask base material by using modified antibacterial silks as substrate. The method comprises the following steps (1) preparing a nano-silver solution; (2) preparing a nano-silver matching fluid; (3) preparing nano-silver containing mulberry leaves; (4) preparing modified mulberry leaves; (5) adding the nano-silver mulberry leaves to a mount cocooning frame for silkworms developing to the fourth day of the fifth instar, and reeling silkworm cocoons until the silkworms grow to the mounting stage to obtain nano-silver-containing mulberry silks; and (6) preparing silk fibers from the silks, cross spinning cotton staples and silk fibers into a facial mask. The facial mask prepared bythe method can be applied to various facial mask products, and has an important practical significance to development of the skin-care product industry in China.

Description

technical field [0001] The invention relates to the technical field of skin care products, in particular to a method for preparing a mask base material based on modified antibacterial silk. Background technique [0002] Mask is an important beauty and skin care product produced by contemporary people. Through the mask, people can complete a series of skin maintenance functions such as cleaning, moisturizing, moisturizing, sterilization, spot removal, whitening, and wrinkle removal. With the development of technology, more and more types of facial masks have been invented. At present, there are polyester, blended, kaolin blended, non-woven fabrics, cotton silk, silk, tencel, biological fibers and other products that are mainly used. Each of these masks has its advantages and disadvantages, and each has its own advantages and disadvantages. [0003] As the top grade of textile fibers, silk has incomparable advantages over other fibers. Silk has soft luster, smooth hand feeli...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): D01F4/02D01F1/10D03D15/00A23K50/90A23K20/20D03D15/217D03D15/233D03D15/50
CPCA23K20/30A23K50/90D01F1/103D01F4/02D03D15/258
Inventor 彭志勤刘珉琦池贺海胡智文
Owner ZHEJIANG SCI-TECH UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products