A high-power semiconductor laser based on PT Bragg reflection waveguide and its preparation method
A Bragg reflection, semiconductor technology, used in semiconductor lasers, lasers, laser parts and other directions, can solve the problems of complex manufacturing process, difficult beam coupling, unstable lasing beam, etc., achieve high COD threshold, improve injection efficiency, Beneficial for heat dissipation
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Embodiment 1
[0047] A high-power semiconductor laser based on PT Bragg reflective waveguide, such as figure 1 As shown, including InP substrate 1 and InP cladding layer 2, InP substrate 1 and InP cladding layer 2 are provided with a low refractive index central cavity 3 and PT Bragg reflection grating regions 5 located on both sides of the low refractive index central cavity 3, Both the low-refractive-index central cavity 3 and the PT Bragg reflection grating area 5 run through the entire z-axis, such as figure 2 shown;
[0048] The low-refractive-index central cavity 3 is formed by wrapping a high-refractive-index strip waveguide with a low-refractive-index material, and the PT Bragg reflection grating region 5 includes a quantum well structure.
Embodiment 2
[0050] A high-power semiconductor laser based on PT Bragg reflection waveguide, the structure is as shown in Embodiment 1, the difference is that the InP substrate 1 is the lower end face and the upper end face of the InP cladding layer 2 is provided with a contact electrode 4, such as figure 2 As shown, the upper and lower bottom surfaces in the y direction are the contact electrodes 4, from which the current is injected.
Embodiment 3
[0052] A high-power semiconductor laser based on PT Bragg reflection waveguide, the structure is as shown in embodiment 2, the difference is that the low refractive index central cavity 3 is made of SiO 2 The material 3-1 wraps the InAlGaAs strip waveguide 3-2, and the effective refractive index of the low-refractive index central cavity 3 is lower than that of the PT Bragg reflection grating regions on both sides.
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