MEMS ring solenoid inductor and manufacturing method thereof

Abstract

The embodiment of the invention provides an MEMS ring solenoid inductor, which comprises a silicon substrate, a ring soft magnetic core and a solenoid; the ring soft magnetic core is enclosed in the silicon substrate, the silicon substrate is provided with a spiral hole channel, and the ring soft magnetic core passes through the center of the spiral hole channel, and the solenoid is arranged in the spiral hole channel. By arranging the ring soft magnetic core and solenoid of the inductor at the inner part of the silicon substrate, the thickness of the silicon substrate is fully used, the winding cross-section area of the inductor is larger, the magnetic flux is increased, and the inductance value of the inductor is increased. Meanwhile, the silicon substrate can protect the ring soft magnetic core and the solenoid, the strength of the inductor is improved and the inductor has good impact resistance.

Description

technical field [0001] Embodiments of the present invention relate to the technical field of micro-electromechanical systems (MEMS), and more specifically, relate to a MEMS toroidal solenoid inductor and a manufacturing method thereof. Background technique [0002] Micro-Electro-Mechanical System (MEMS) micro-inductors are composed of magnetic cores and windings. Compared with conventional inductors, the size of the magnetic core is greatly reduced, and the form of windings is also changed. Micro-inductors are widely used in micro-electronic equipment and information equipment, and can perform functions such as voltage conversion, current conversion, impedance conversion, isolation, and voltage stabilization. [0003] At present, micro-inductors based on MEMS technology are mainly divided into two types, planar spiral type and solenoid type. Among them, as the structure of the planar spiral inductor increases with the number of winding turns, the diameter of the coil become...

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Problems solved by technology

[0004] However, at present, most of the micro-inductors based on the MEMS process adopt a thin-film manufacturing process. The thin-film manufacturing process is an additive manufacturing method, so most of the structures of the obtained micro-inductors are on the substrate, resulting in inductors The strength is difficult to guarantee, and the impact resistance is poor; at the same time, the vertical height that can be obtained by the thin film manufacturing process is limited, so that the winding cross-sectional area of ​​the inductor is small, the magnetic flux is small, and the inductance value of the inductor is low

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