The invention provides a treatment device for
polycrystalline silicon reduction
tail gases. The treatment device comprises a scrubbing
tower, a
circulating pump protection unit, a scrubbing
tower circulating pump, a dust removal unit, a multistage cooling unit and a multistage
activated carbon adsorption unit, wherein the scrubbing
tower is used for rinsing reduction
tail gases, outputting siliconpowder-containing
chlorosilane liquid from the column bottom and outputting non-condensable gas from the tower top; the
circulating pump protection unit is used for removing
silicon powder and impurities in the
silicon powder-containing
chlorosilane liquid and outputting
chlorosilane liquid; the scrubbing tower circulating pump is used for pressurizing the chlorosilane liquid and feeding the liquid into the scrubbing tower to participate in rinsing; the dust removal unit is used for removing
silicon powder in the non-condensable gas so as to obtain non-condensable gas subjected to dust removal; the multistage cooling unit is used for sequentially performing multistage cooling on the non-condensable gas subjected to dust removal, totally condensing the chlorosilane therein, feeding the chlorosilane into a chlorosilane condensate collection tank, and outputting
impurity-containing
hydrogen; the multistage
activated carbon adsorption unit is used for performing multistage adsorption on the
impurity-containing
hydrogen output by the multistage cooling unit in sequence, obtaining pure
hydrogen and feeding the hydrogen into a hydrogen
buffer tank. According to the treatment device disclosed by the invention, the silicon powder in the reduction
tail gases can be effectively reduced.