Treatment device for polycrystalline silicon reduction tail gases
A processing device and polysilicon technology, applied in gas processing, combined device, halogenated silane, etc., can solve the problems of system shutdown, large number of equipment, wear and tear, etc., to reduce processing energy consumption, reduce investment quota, and achieve high economic benefits. Effect
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[0036] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments.
[0037] The embodiment of the present invention provides a processing device for polysilicon reduction tail gas, which mainly relates to the research of polysilicon production technology and the application of the device in polysilicon production. The reduced tail gas has a temperature of about 130°C and a pressure of 0.45 MPa, which includes a mixed gas of hydrogen, chlorosilane and a small amount of silicon powder. The chlorosilane includes trichlorosilane, silicon tetrachloride and dichlorodihydrosilane . Among them, the volume percentage of silicon powder in the reduction tail gas is only 0.1%. Although the proportion is small, it has a greater impact on the polysilicon production process and should be removed; of course, the mixed ...
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