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Atomizing cold plasma jet generation device

A cold plasma and generating device technology, applied in the direction of plasma, electrical components, etc., can solve the problems of difficult to achieve cooling and lubrication effect, limited cooling effect, difficult heat in cutting contact area, etc.

Inactive Publication Date: 2019-02-12
DALIAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the cooling effect of this method is limited, and it is still difficult to achieve the cooling and lubricating effect achieved by the traditional cooling liquid pouring method. series of questions

Method used

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  • Atomizing cold plasma jet generation device
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  • Atomizing cold plasma jet generation device

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specific Embodiment

[0025] An atomized cold plasma jet generator, including working gas 12, gas pressure controller 11, and gas flow controller 10, which are sequentially connected through pipelines; the output end of gas flow controller 10 is connected to a cylindrical inner shell through pipelines The tail end of 13; the needle electrode 6 is fixed in the through hole in the center of the cylindrical inner shell 13, the nozzle electrode 7 is fixed on the front end of the cylindrical inner shell 13, and is coaxial with the needle electrode 6; the output end of the high voltage power supply 5 is connected to one end The needle electrode 6, the other end is connected to the nozzle electrode 7 and grounded. The working gas enters the cylindrical inner shell 13 from the tail end through the gas pressure controller 11 and the gas flow controller 10 at a stable flow rate from the working gas source 12, passes through the vent holes uniformly distributed around the needle electrode 6, and enters the noz...

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Abstract

The invention discloses an atomizing cold plasma jet generation device, which comprises a gas supply system, an atomizing system, a high-voltage power supply, a cold plasma jet generation device and acylindrical outer shell, wherein the cold plasma jet generation device is mounted in the cylindrical outer shell, and the cold plasma jet generation device and the cylindrical outer shell are coaxial; the gas supply system inputs working gas into the cold plasma jet generation device from the tail part; the high-voltage and low-voltage output ends of the high-voltage power supply are connected with electrodes of the cold plasma jet generation device; the atomizing device inputs atomized liquid into the interior of the cylindrical shell; when the cold plasma jet generated by the cold plasma jet generation device is ejected, negative pressure is generated inside the cylindrical outer shell, the atomized liquid is introduced into the cylindrical outer shell and is mixed with the cold plasmajet to form the atomized cold plasma jet, and the atomized cold plasma jet is ejected at an outlet of the cylindrical outer shell. Uniform and stable atomized cold plasma jet is obtained by the atomizing cold plasma jet generation device, and the hydrophilic modification effect of the plasma on the solid surface and the cooling and lubricating effects of the cutting contact area in the cutting process are favorably improved.

Description

technical field [0001] The invention relates to an atomized cold plasma jet generator, which belongs to the technical field of plasma discharge reactors. Background technique [0002] The macroscopic temperature of cold plasma is not high, but the ratio of electron temperature to gas temperature is about 10 to 100 to 1, so it also has high chemical activity: it is rich in a large number of ions, electrons, excited state atoms, molecules and Active particles such as free radicals have more types and stronger activity than those produced in common liquid and gas chemical reactors, and are easy to react with the surface of the material they are in contact with. Therefore, in recent years, cold plasma has been widely used in sterilization, ozone synthesis, solid film deposition, surface modification (improving the water absorption, conductivity, adhesion, printing and dyeing and wettability of films, paper, textiles and fibers), Plasma etching, device cleaning, air pollution tr...

Claims

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Application Information

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IPC IPC(8): H05H1/42
CPCH05H1/42
Inventor 刘新王冠淞刘硕刘吉宇宋金龙孙晶陈发泽
Owner DALIAN UNIV OF TECH
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