Sputtering target cooling device based on IBAD nano-coating equipment
A cooling device, nano-coating technology, applied in the direction of coating, sputtering plating, metal material coating process, etc., can solve the problem of not being able to ensure sufficient contact between cooling water and the back plate, reducing the cooling effect of the sputtering target, and affecting Problems such as sputtering target cooling effect, to reduce quality and production continuity, avoid water leakage, and improve cooling effect
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[0030] The present invention will be further described below with reference to the accompanying drawings and specific embodiments, so that those skilled in the art can better understand and implement the present invention, but the examples cited are not intended to limit the present invention.
[0031] Reference figure 1 As shown, an embodiment of the sputtering target based on the IBAD nano-coating equipment of the present invention includes the body, because the IBAD equipment has extremely high requirements for vacuum, which needs to be 4.5*10 -7 Torr can be used for film preparation, and the target needs to be cleaned before each process. The target is fixed on the cooling device. Cleaning the target will cause the cooling device to shake, which will loosen the screw and cause water to leak out, which will destroy the vacuum state and affect the film preparation. Therefore, in this embodiment, the body is integrally formed, and the integrally formed body can reduce the sealing...
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