Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Anti-microbial fabric

An antibacterial fabric and fabric technology, applied in the field of fabrics, can solve the problems of inconspicuous antibacterial effect, low comfort, and poor antibacterial effect, and achieve good antibacterial effect, excellent antibacterial and sterilizing performance, and smooth surface

Inactive Publication Date: 2019-03-26
SWOTO PROTECTION & TECH CO LTD +1
View PDF1 Cites 4 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] Technical problem to be solved: Aiming at the shortcomings of existing textiles such as inconspicuous antibacterial effect, poor antibacterial effect, and low comfort, the present invention provides an antibacterial fabric, which has the functions of adsorption and purification, deodorization and antibacterial, sterilization and repellent mite, etc.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Anti-microbial fabric
  • Anti-microbial fabric
  • Anti-microbial fabric

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] This embodiment provides a kind of antibacterial fabric, and this fabric is inner layer fabric 1 and outer layer fabric 2 successively from inside to outside, and inner layer fabric 1 and outer layer fabric 2 are laminated and connected by the mode of yarn sewing; The inner layer fabric 1 is a plain weave structure woven with bamboo charcoal fiber as the warp yarn and graphene inner warming fiber as the weft yarn, the warp density of the warp yarn is 196 / 10cm, and the weft density of the weft yarn is 158 / 10cm; the outer fabric 2 is composed of The concave-convex honeycomb mesh structure formed by the rib weave and the tuck weave, the rib weave is on the bottom, the tuck weave is on the top, the hanging arcs of the two adjacent tuck coils of the tuck weave overlap, and the rib weave and the tuck weave are formed by double twisting Yarn, and twisted yarn is made of kapok fiber yarn and hollow polyester yarn and twisted.

[0022] The thickness of the inner fabric 1 is 0.25...

Embodiment 2

[0024] The difference between embodiment 2 and embodiment 1 is that the thickness of the inner fabric 1 is 0.25mm, and the thickness of the outer fabric 2 is 0.30mm.

Embodiment 3

[0026] The difference between embodiment 3 and embodiment 1 is that the thickness of the inner fabric 1 is 0.30mm, and the thickness of the outer fabric 2 is 0.35mm.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Thicknessaaaaaaaaaa
Login to View More

Abstract

The invention provides an anti-microbial fabric. The anti-microbial fabric comprises an inner layer fabric and an outer layer fabric in turn from inner to outer; the inner layer fabric and the outer layer fabric are overlapped and connected with each other in the manner of yarn stitching; the inner layer fabric has a plain weave structure; the outer layer fabric has a concavo-convex honeycomb meshed structure formed by rib stitches and tuck stitches; the rib stitches are on lower side while the tuck stitches are on upper side; suspending arcs of two adjacent tuck loops of the tuck stitches areoverlapped; a convex part is formed by overlapped parts of suspending arcs of two alternated continuous horizontal tuck stitches; a concave part is formed by normally weaved loops. The anti-microbialfabric provided by the invention has the functions of adsorption purification, deodorizing, antibiosis, sterilization, mite dispelling, and the like.

Description

technical field [0001] The invention belongs to the field of fabrics, in particular to an antibacterial fabric. Background technique [0002] With the advancement of science and technology and the development of society, people's demand and requirements for textile fabrics have also increased and improved. In daily life, people inevitably come into contact with various bacteria, fungi and other microorganisms. Some of these harmful organisms will grow and reproduce rapidly under suitable environmental conditions, ranging from mildew and mildew to spreading diseases. , affect people's health, and all kinds of textiles are good living places for these microorganisms and an important source of disease transmission. With the rapid development of industry and the improvement of people's living standards, people's requirements for quality of life are getting higher and higher. With increasing emphasis on the environment and health, antibacterial textiles are becoming more and mor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B32B5/06B32B9/00B32B9/02B32B9/04B32B27/02B32B27/36B32B7/08B32B7/12
CPCB32B5/022B32B5/024B32B5/026B32B5/06B32B5/08B32B5/26B32B7/08B32B7/12B32B2250/20B32B2262/0284B32B2262/062B32B2262/08B32B2262/106B32B2262/14B32B2307/7145B32B2307/724B32B2437/00
Inventor 傅佳佳巫瑛王鸿博陈太球王炳来蒋春燕叶远丽李飞李楠楠申申李宇丁若男
Owner SWOTO PROTECTION & TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com