Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Alkali metal air chamber manufacturing method for improving relaxation resistance of coating based on Plasma hydroxylation

An alkali metal gas chamber and hydroxylation technology, applied in the direction of metal material coating process, etc., can solve the problems of complex cleaning steps, poor anti-relaxation effect, uneven coating coverage, etc., so as to improve the anti-relaxation performance and solve the Poor consistency, the effect of simplifying the operation steps

Active Publication Date: 2019-03-26
杭州诺驰生命科学有限公司
View PDF6 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The consistency of the gas chambers obtained by the current production method is poor. Even if the gas chambers are produced in the same batch, the performance of different gas chambers varies greatly. The big reason is that the anti-relaxation coating of the alkali metal gas chamber is produced The cleaning steps are more complicated, time-consuming and require a lot of manual operations. Time-consuming will cause the loss of the number of hydroxyl groups, resulting in uneven coating coverage, resulting in poor anti-relaxation effects, and manual operations will cause differences in cleaning effects. Larger, less consistent anti-relaxation effect

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Alkali metal air chamber manufacturing method for improving relaxation resistance of coating based on Plasma hydroxylation
  • Alkali metal air chamber manufacturing method for improving relaxation resistance of coating based on Plasma hydroxylation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0021] Such as figure 1 As shown, the glass syringe connected with capillary glass tube includes capillary glass tube 1, syringe 2, and polytetrafluoroethylene tube 3; it has the function of a general syringe, and because it is all made of glass, it can effectively reduce the coating process. , The introduction of impurities.

[0022] Such as figure 2 As shown, a kind of alkali metal air cell manufacturing method based on Plasma hydroxylation of the present invention to improve the anti-relaxation performance of the coating is realized as follows:

[0023] (1) Select a 0.9-1.1mm capillary glass tube and connect it to a glass syringe through polytetrafluoroethylene.

[0024] (2) Put the alkali metal gas chamber made of high borosilicate, glass syringe with capillary glass tube, beaker, and polytetrafluoroethylene magnetic stirrer in an ultra...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to an alkali metal air chamber manufacturing method for improving the relaxation resistance of a coating based on Plasma hydroxylation. According to the method, a plasma cleaningmachine is adopted for hydroxylating the inner surface of an air chamber; since a tail pipe of the alkali metal air chamber is thin, the operation that a thick cleaning solution needs to be extractedby adopting a capillary glass tube after cleaning through a traditional hydroxylation method is omitted, so that the air chamber is prevented from being pricked during a cleaning solution extractionprocess, and the problems of time waste, effort waste, nonideal consistency and nonideal relaxation resistance during the current air chamber manufacturing process are solved; and meanwhile, more hydroxide radicals can be formed on the glass surface, and no cleaning solution removal and follow-up drying is needed, so that the contact time of the hydroxide radicals and the outside environment is shortened, the hydroxide radical pollution is reduced, more hydroxide radical number can be maintained, a smooth and uniform covering surface is realized during the organochlorosilane reaction process,the surface covering rate on paramagnetic impurities is increased, and the relaxation resistance of the coating is improved. In addition, multiple air chambers can be processed at the same time, so that the consistency and the repeatability in manufacturing the coating are improved.

Description

technical field [0001] The invention relates to the technical field of making alkali metal gas chambers, in particular to a method for manufacturing alkali metal gas chambers based on Plasma hydroxylation to improve the anti-relaxation performance of the coating, which can be applied to the alkali metal gas chambers in atomic clocks and atomic magnetometers Fabrication, in addition, can be applied to magneto-optical traps, quantum storage, and slow-light experiments. Background technique [0002] Taking the atomic magnetometer as an example, the core sensitive device of the atomic magnetometer is the alkali metal gas chamber, and the polarization time of the alkali metal atoms in the gas chamber affects the sensitivity of the atomic magnetometer. The longer the polarization time, the higher the sensitivity, so , it is of great significance to increase the polarization time of alkali metal atoms. The collision between the alkali metal atoms and the walls of the alkali metal ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C23C22/78
CPCC23C22/78C23C2222/20
Inventor 全伟池浩湉陆吉玺房建成
Owner 杭州诺驰生命科学有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products