Beauveria bassiana tertiary medium and preparation method thereof

A technology of Beauveria bassiana and culture medium, which is applied in the field of three-stage culture medium of Beauveria bassiana and its preparation, which can solve the problems of low yield and many miscellaneous bacteria, and achieve the effect of low cost consumption

Active Publication Date: 2022-07-22
宜昌兴林生物科技有限公司 +1
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Beauveria bassiana spore powder currently produced in the market has a sporulation rate of about 100 billion / g, and the yield is low, and there are many miscellaneous bacteria. The choice of medium has a lot of influence on it

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A tertiary medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 25 parts of chaff, 25 parts of wheat bran, 0.006 part of oxytetracycline, and 40 parts of water.

Embodiment 2

[0027] A tertiary medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 20 parts of chaff, 30 parts of wheat bran, 0.007 part of oxytetracycline, and 50 parts of water.

Embodiment 3

[0028] Embodiment 3: a tertiary medium for Beauveria bassiana, comprising the following raw materials in parts by weight: 30 parts of chaff, 20 parts of wheat bran, 0.005 part of oxytetracycline, and 30 parts of water.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a tertiary medium for Beauveria bassiana and a preparation method thereof. The tertiary medium for Beauveria bassiana comprises the following raw materials in parts by weight: 20-30 parts of chaff, 20 parts of wheat bran ‑30 parts, oxytetracycline 0.001‑0.01 parts and 30‑50 parts water. Can also include KH 2 PO 4 . By adding oxytetracycline to the medium formula and the water used, most microorganisms in the tap water are killed, which further ensures the low-microbial environment state of Beauveria bassiana in the long-term medium for 5-7 days, and makes Beauveria bassiana an advantage in an open environment bacterial growth. By adopting the medium provided by the invention for tertiary culture, the produced Beauveria bassiana high sporopollen is up to 230 billion / g.

Description

technical field [0001] The invention relates to the field of preparation of Beauveria bassiana, in particular to a tertiary culture medium of Beauveria bassiana and a preparation method thereof. Background technique [0002] Beauveria bassiana (Beauveria bassiana) is an ascomycete fungus, which can be industrially cultured and produced, and the conidia produced by it can be processed into microbial pesticides. Beauveria bassiana hypersporopollen is non-toxic and tasteless, and has no environmental pollution. It has persistent infectivity to pests. Once infected, pests can continuously infect and spread; it can parasitize more than 700 species of insects from 15 orders and 149 families, which is relatively safe for humans, animals and the environment. Pests are generally not easy to develop drug resistance, and can be used together with some chemical pesticides (insecticides, acaricides, fungicides). The most successful control of Beauveria bassiana in China is the agricultu...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): C12N1/14C12N3/00C12R1/645
CPCC12N1/14C12N3/00
Inventor 王永久胡玉伟戈媛媛毛永凯赵东容毛玉玲张建华李继虎唐桂林
Owner 宜昌兴林生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products