Preparation method of large-size fine-crystal-grain niobium pipe target material for coating

Abstract

The invention discloses a preparation method of a large-size fine-crystal-grain niobium pipe target material for coating. The method comprises the following steps: 1, performing vacuum electronic beammelting on niobium bars to obtain niobium casting ingots; 2, forging the niobium casting ingots with two heating numbers and then machining the niobium casting ingots to obtain niobium pipe blanks; 3, coating and sealing the niobium pipe blanks by adopting a sheathed material and coating a lubricant, performing heating and heat insulation, and performing extrusion to obtain a niobium pipe target;4, straightening the niobium pipe target and removing the sheathed material in an acid pickling manner, and then performing vacuum thermal treatment; and 5, machining the niobium pipe target subjected to vacuum thermal treatment, and then performing polishing treatment on the niobium pipe target to obtain the niobium pipe target material. Through a combined processing method of forging with two heating numbers and high-temperature extrusion, the size difference of the crystal grains of various areas in the niobium pipe target is reduced, so that uniform and fine crystal grain tissues are obtained, and the niobium pipe target material with the crystal grains which have the average sizes of being less than 80 micrometers in the tissues can be obtained; and meanwhile, the specification of the niobium pipe target material is improved to ensure that the niobium pipe target material is applied to niobium coating.

Description

technical field [0001] The invention belongs to the technical field of niobium tube target material preparation, and in particular relates to a method for preparing a large-size fine-grain niobium tube target material for coating. Background technique [0002] Niobium coating targets are important raw materials for preparing niobium and its alloy thin film materials, and are widely used in optoelectronic fields such as flat display, optical coating, electronic imaging, information storage media, solar cells, and corrosive environments such as ships and chemicals. With the rapid development of my country's microelectronics information industry, my country has gradually become one of the countries with the largest demand for coated targets in the world. However, compared with foreign countries, there is still a large gap between my country's target technology and the industrial level. Still relying heavily on foreign imports, it is urgent to get rid of the plight of being contr...

AI Technical Summary

Problems solved by technology

[0003] Studies have shown that sputtering targets will produce uneven erosion during the sputtering process, resulting in a generally low utilization rate of sputtering targets. The utilization rate of rectangular sputtering targets generally does not exceed 28%, and the utilization rate of circular sputtering targets does not exceed 35%, the utilization rate of the planar sputtering target is basically controlled at about 25% in the actual use process