Implanted intracranial pressure monitoring device, monitoring system and using method of monitoring system

A monitoring device and intracranial pressure technology, applied in the field of medical devices, can solve problems such as inaccurate indirect measurement, difficult and risky surgery, semi-open wound infection, etc., to achieve accurate measurement of changes in intracranial pressure, high sensitivity and stability The effect of sex and convenience of implantation

Inactive Publication Date: 2019-05-07
JIANGSU JITRI INTELLIGENT SENSOR RES INST CO LTD +1
View PDF10 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For traditional invasive monitoring methods, neurosurgery clinical units usually implant one end of the pressure probe semi-openly into the ventricle or brain tissue for monitoring by means of wires, and the other end is electrically connected to the monitoring equipment by means of wires, although This method can directly and accurately measure intracranial pressure, but this method needs to implant the pressure probe into the ventricle or brain tissue, so the operation is relatively difficult and risky, and the wired connection method is easy to cause infection in the semi-open wound
For non-invasive monitoring methods, although infections caused by invasive operations can be avoided, non-invasive monitoring methods have the problem of inaccurate indirect measurement

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Implanted intracranial pressure monitoring device, monitoring system and using method of monitoring system
  • Implanted intracranial pressure monitoring device, monitoring system and using method of monitoring system
  • Implanted intracranial pressure monitoring device, monitoring system and using method of monitoring system

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] Exemplary embodiments of the present invention are described below in conjunction with the accompanying drawings, which include various details of the embodiments of the present invention to facilitate understanding, and they should be regarded as exemplary only. Accordingly, those of ordinary skill in the art will recognize that various changes and modifications of the embodiments described herein can be made without departing from the scope and spirit of the invention. Also, descriptions of well-known functions and constructions are omitted in the following description for clarity and conciseness.

[0038] See attached Figure 1-2 , the implantable intracranial pressure monitoring device 21 of the present invention includes a sensing module 4, and the sensing module 4 includes a flexible base layer, a pressure sensing chip and a flexible covering layer; the pressure sensing chip is located in the The flexible base layer; the flexible coating layer covers at least the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to an implanted intracranial pressure monitoring device, a monitoring system and a using method of the monitoring system. The implanted intracranial pressure monitoring device comprises a sensing module, and the sensing module comprises a flexible substrate layer, a pressure sensing chip and a flexible coating layer; the pressure sensing chip is positioned on the flexible substrate layer, and the flexible coating layer at least coats the pressure sensing chip; the sensing module is embedded between skull and dura mater; and an in-vitro data reader matching with the implanted intracranial pressure monitoring device is used for realizing power supply, control and data transmission and reading of the implanted intracranial pressure monitoring device through wireless electromagnetic waves. According to the invention, the flexible substrate layer is used as the substrate of the implanted intracranial pressure monitoring device, and a core mainboard with low power consumption and an absolute pressure sensor with high precision, miniaturization and high reliability are adopted, so that the device has the advantages of long implantation service life, accurate monitoring, good stability, good safety and convenient implantation.

Description

technical field [0001] The invention belongs to the technical field of medical devices, and in particular relates to an implantable intracranial pressure monitoring device, a monitoring system and a use method thereof. Background technique [0002] In the clinical work of craniotomy in neurosurgery, the patient's intracranial pressure is a crucial clinical indicator, which refers to the pressure of cerebrospinal fluid in the cranial cavity, and the normal value is 10-15 mm Hg. The increase of intracranial pressure may lead to a series of physiological dysfunction and pathological changes, manifested as headache, nausea, vomiting and other symptoms. Therefore, timely and accurate monitoring of the intracranial pressure value of patients is very important for clinical diagnosis and guidance of treatment. Significance. [0003] At present, the clinical intracranial pressure monitoring methods can be divided into two categories: invasive and noninvasive. For traditional invasi...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61B5/03
Inventor 刘文朋刘钢胡友德许锦龙王驹刘平詹敏华汪昊朱滨
Owner JIANGSU JITRI INTELLIGENT SENSOR RES INST CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products