Device for separating positive and negative ions, film forming equipment and chamber cleaning method

A technology of positive and negative ions and film-forming equipment, which is applied in the direction of circuits, discharge tubes, electrical components, etc., can solve problems such as energy waste, low ions, and complicated equipment structure, so as to improve cleaning effect, improve cleaning efficiency, and avoid composite problems Effect
CN109841471BActive Publication Date: 2021-12-17BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
Publication Date
2021-12-17

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Abstract

The invention discloses a device for separating positive and negative ions, which is used to realize the separation of positive and negative ions in a plasma source. The opening and the second opening; the electric field generating component is used to generate an electric field with alternating directions, which can make the positive ions and negative ions move to the bottom of the insulating cavity alternately under the force of the electric field; the magnetic field generating component is used to make the negative ions move in the Luo The positive ions enter the first opening after being deflected under the action of the Lorentz force, or the positive ions enter the second opening after being deflected under the action of the Lorentz force. The invention can effectively avoid the recombination of positive and negative ions, and improve the cleaning effect and cleaning efficiency of film forming equipment. The invention also provides a film-forming device equipped with a device for separating positive and negative ions and a chamber cleaning method thereof.
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Description

technical field

[0001] The invention relates to the technical field of semiconductor equipment, and more specifically, to a device for separating positive and negative ions, film forming equipment and a chamber cleaning method. Background technique

[0002] In recent years, semiconductor equipment has developed rapidly, involving semiconductors, integrated circuits, solar panels, flat-panel displays, microelectronics, light-emitting diodes, etc., and these devices are mainly composed of several layers of thin films with different material thicknesses formed on a substrate. During the film forming process, the film will also grow on the surface of other parts of the film forming equipment, such as the lower surface of the gas shower head, the edge of the heating base, the inner wall of the uniform flow grid, etc. These films are easy to fall off and produce particles, which affect the quality of film formation; therefore, film formation equipment requires frequent and regular...

Claims

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