Grinding and polishing method for TFT-LCD glass base plate

Abstract

The invention relates to a grinding and polishing method for a TFT-LCD glass base plate. The grinding and polishing method includes the existing steps of rough grinding and fine grinding. The grindingand polishing method is characterized by comprising the following steps that a grinding machine is used for rough grinding in the first stage, the grinding amount is 15 microns to 20 microns, and theroughness degree is controlled to be within 0.15 micron; secondly, the grinding machine is adopted for fine grinding in the second stage, the grinding amount is 5 microns to 10 microns, and the roughness degree is controlled to be within 0.1 micron; and thirdly, the grinding machine is adopted for grinding and polishing in the third stage, a grinding disc and a grinding disc bearing are made of iron materials, the material of a grinding pad is in a chamois leather simulating type, the frequency of an upper plate can be 50 hertz to 60 hertz, the frequency of a lower plate can be 20 hertz to 30hertz, the grinding time ranges from 5 min to 10 min, the grinding amount is 5 microns to 10 microns, and the roughness degree is controlled to be within 0.01 micron. The grinding and polishing method has the beneficial effects that firstly, the rotating speed can be adjusted more reasonably according to technological requirements, and the grinding precision and the grinding efficiency are improved; secondly, a polishing machine is little affected by the temperature, a rotary disc works stably, and the grinding precision is greatly improved; and thirdly, under grinding is reduced, and the product quality is improved.

Description

technical field [0001] The invention belongs to the field of glass preparation, relates to the field of TFT-LCD glass preparation, in particular to a grinding and polishing method for a TFT-LCD glass substrate. Background technique [0002] In the float glass forming process, the uneven temperature of the tin bath (there are many factors that affect the temperature change of the tin bath) will lead to differences in the viscosity of the glass liquid, affecting the flow of the liquid flow, resulting in a difference in the speed of the glass liquid flow and uneven stretching Will cause surface ripples (a major factor affecting the quality of ultra-thin glass products). [0003] The TFT-LCD glass substrate produced by the existing float method first undergoes three times of grinding and polishing (rough grinding, fine grinding, fine grinding) and there are still 0.1-0.5μm roughness and waviness greater than 0.15μm / 20mm on the surface of the glass substrate ( The waviness is re...

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Problems solved by technology

[0002] In the float glass forming process, the uneven temperature of the tin bath (there are many factors that affect the temperature change of the tin bath) will lead to differences in the viscosity of the glass liquid, affecting the flow of the liquid flow, resulting in a difference in the speed of the glass liquid flow and uneven stretching Can cause surface ripples (a major factor affecting the quality of ultra-thin glass products)

[0003] The TFT-LCD glass substrate produced by the existing float method is firstly ground and polished three times (coarse grinding, fine grinding, and fine grinding). The waviness is required to be less than 0.15μm / 20mm), which affects the quality of glass products to a certain extent

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