Fabrication method of transparent conductive film structure
A technology of transparent conductive film and production method, which is applied in the direction of equipment for manufacturing conductive/semiconductive layer, cable/conductor manufacturing, circuit, etc., can solve the problem of high production cost, achieve fast grinding rate, reduce production cost, and ensure The effect of the zero-valent valence state
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[0056] The following specific examples illustrate the implementation of the present invention. Those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification.
[0057] See Figure 1 to Figure 7 . It should be noted that the structure, ratio, size, etc. shown in the accompanying drawings in this specification are only used to match the content disclosed in the specification for the understanding and reading of those familiar with this technology, and are not intended to limit the implementation of the present invention Limited conditions, so it has no technical significance. Any structural modification, proportional relationship change or size adjustment should still fall under the present invention without affecting the effects and objectives that can be achieved by the present invention. The disclosed technical content must be within the scope of coverage. At the same time, the terms such as ...
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