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Essence mask and preparation method thereof

A technology of essence and facial mask, which is applied in the direction of pharmaceutical formulations, cosmetic preparations, dressing preparations, etc. It can solve the problems of general moisturizing effect and poor essence absorption effect, etc., and achieve good moisturizing effect, good moisturizing performance, and easy-to-skin effect

Inactive Publication Date: 2019-08-27
苏州市熹朵化妆品有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Aiming at the deficiencies of the prior art, the present invention provides an essence facial mask and its preparation method, which has the advantages of good moisturizing effect, etc., and solves the problem that the traditional facial mask has a general moisturizing effect due to the limitation of the composition of its essence, and the absorption of the essence by the skin. The effect is poor, and users are quite annoyed by this problem

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] Embodiment 1: An essence mask, including a mask base and a water-rejuvenating essence, and the water-rejuvenating essence is stored in the mask base.

[0025] The mask matrix is ​​silk cloth, and the silk is tussah silk.

[0026] The Aqua Skin Peeling Essence contains the following raw materials in proportion by weight: 87.85% of water, 5% of butanediol, 5% of glycerin, 0.2% of carbomer, 0.15% of triethanolamine, 0.5% of skin conditioner, hyaluronic acid Sodium 0.1%, Caprylyl Hydroxamic Acid 1.5%, Propylene Glycol 1.5%, α-Arbutin 0.5%, Hydrolyzed Sclerotium ROLFSSII Gum 0.2%, p-Hydroxyacetophenone 0.2%, Glyceryl Caprylate 1% and disodium EDTA 0.05%, the skin conditioner includes the following raw materials in proportions by weight: 20% of PELARGONIUM GRAVEOLENS extract, 20% of SOPHORA ANGUSTIFOLIA root extract, 20% of golden chamomile (CHRYSANTHELLUM INDICUM) Extract 20%, Purslane (PORTULACAOLERACEA) Extract 15%, Aloe Barbadensis (ALOE BARBADENSIS) Extract 15%, Mint (M...

Embodiment 2

[0037] Embodiment 2: An essence mask, including a mask base and a water-rejuvenating essence, and the water-rejuvenating essence is stored in the mask base.

[0038] The mask matrix is ​​silk cloth, and the silk is tussah silk.

[0039] The Aqua Skin Peeling Essence contains the following raw materials in proportion by weight: 87.85% of water, 5% of butanediol, 5% of glycerin, 0.2% of carbomer, 0.15% of triethanolamine, 0.5% of skin conditioner, hyaluronic acid Sodium 0.1%, Caprylyl Hydroxamic Acid 1.5%, Propylene Glycol 1.5%, α-Arbutin 0.5%, Hydrolyzed Sclerotium ROLFSSII Gum 0.2%, p-Hydroxyacetophenone 0.2%, Glyceryl Caprylate 1% and disodium EDTA 0.05%, the skin conditioner includes the following raw materials in proportions by weight: 20% of PELARGONIUM GRAVEOLENS extract, 20% of SOPHORA ANGUSTIFOLIA root extract, 20% of golden chamomile (CHRYSANTHELLUM INDICUM) Extract 20%, Purslane (PORTULACAOLERACEA) Extract 15%, Aloe Barbadensis (ALOE BARBADENSIS) Extract 15%, Mint (M...

Embodiment 3

[0050] Embodiment 3: An essence mask, including a mask base and a water-rejuvenating essence, and the water-rejuvenating essence is stored in the mask base.

[0051] The mask matrix is ​​silk cloth, and the silk is tussah silk.

[0052] The Aqua Skin Peeling Essence contains the following raw materials in proportion by weight: 87.85% of water, 5% of butanediol, 5% of glycerin, 0.2% of carbomer, 0.15% of triethanolamine, 0.5% of skin conditioner, hyaluronic acid Sodium 0.1%, Caprylyl Hydroxamic Acid 1.5%, Propylene Glycol 1.5%, α-Arbutin 0.5%, Hydrolyzed Sclerotium ROLFSSII Gum 0.2%, p-Hydroxyacetophenone 0.2%, Glyceryl Caprylate 1% and disodium EDTA 0.05%, the skin conditioner includes the following raw materials in proportions by weight: 20% of PELARGONIUM GRAVEOLENS extract, 20% of SOPHORA ANGUSTIFOLIA root extract, 20% of golden chamomile (CHRYSANTHELLUM INDICUM) Extract 20%, Purslane (PORTULACAOLERACEA) Extract 15%, Aloe Barbadensis (ALOE BARBADENSIS) Extract 15%, Mint (M...

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Abstract

The invention relates to the technical field of masks, and discloses an essence mask, comprising a mask matrix and a hydrating skin rejuvenating essence stored in the mask matrix. A preparation methodof the essence mask comprises the steps of adding 5% of butanediol, 5% of glycerin, 0.2% of carbomer and 0.15% of triethanolamine in 87.85% of water, and stirring uniformly by a stirring device for twenty minutes at a stirring frequency of fifty revolutions per minute, thus obtaining the hydrating skin essence base solution 1; adding 0.1% of sodium hyaluronate, 1.5% of decoyl hydroximic acid, 1.5% of propylene glycol. 1% of glycerol octanoate and 0.05% of EDTA disodium in the skin essence base solution obtained in step 1. 5% of butyl glycol and 5% of glycerin achieve a good moisturizing effect, and 0.15% of triethanolamine regulates he pH value; in this way, the essence has good moisturizing performance, is easy to absorb by skin, eliminates the trouble of a user, and is convenient for the user to use.

Description

technical field [0001] The invention relates to the technical field of facial masks, in particular to an essence facial mask and a preparation method thereof. Background technique [0002] Mask, a category of skin care products, is a carrier of beauty care products. It is applied on the face for beauty functions such as moisturizing, whitening, anti-aging, and oil balance. Mask is actually a short-term skin-encapsulating measure , so if there are other things that should not exist on the skin, such as suppuration, it will have some unexpected effects on the skin, so before applying the mask, it is still necessary to clean properly, remove dead skin scabs, and focus on problem areas Do it after giving appropriate treatment under the guidance of a doctor. Otherwise, the effect of applying the mask will not be achieved, and adverse reactions will occur instead. [0003] Due to the limitation of the composition of the essence, the traditional facial mask has a general moisturi...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/81A61K8/73A61K8/60A61K8/44A61K8/42A61K8/41A61K8/37A61K8/34A61K8/02A61Q19/00
CPCA61K8/0212A61K8/345A61K8/375A61K8/41A61K8/42A61K8/44A61K8/602A61K8/73A61K8/735A61K8/8147A61Q19/00A61K8/9789A61K8/9794
Inventor 王月园
Owner 苏州市熹朵化妆品有限公司
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