Copper particles with anti-oxidation protection on the surface, low-temperature sintered copper paste and sintering process using the same
A technology of low-temperature sintering and copper particles, which is applied in metal processing equipment, semiconductor/solid-state device components, transportation and packaging, etc., and can solve problems such as low surface energy, insoluble, easy oxidation, etc.
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Embodiment 1
[0043] 10 g of copper particles with an average particle diameter of 0.1 μm were selected, and the configuration of the film-forming solution was: 0.75 g of BTA; 0.03 g of DPPD; and 500 ml of water. After film formation, it was confirmed by TEM that a uniform OSP film was formed on the surface of the copper particles with a film thickness of about 5 nm, and it was confirmed by XPS that the DPPD content in the OSP film was about 3.5% by mass.
Embodiment 2
[0045] 12 g of copper particles with an average particle diameter of 1 μm were selected, and the configuration of the film-forming solution was: 1.25 g of IM; 0.12 g of DPPD; and 500 ml of water. After film formation, it was confirmed by TEM that a uniform OSP film was formed on the surface of the copper particles with a film thickness of about 60 nm, and it was confirmed by XPS that the DPPD content in the OSP film was about 7.6% by mass.
Embodiment 3
[0047] 10 g of copper particles with an average particle diameter of 8 μm were selected, and the configuration of the film-forming solution was: 1 g of BIM; 0.05 g of DPPD; and 500 ml of water. After film formation, it was confirmed by TEM that a uniform OSP film was formed on the surface of the copper particles with a film thickness of about 50 nm, and it was confirmed by XPS that the DPPD content in the OSP film was about 4.4% by mass.
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