9t TFET and MOSFET Hybrid SRAM Cell Circuit with High Write Margin

A unit circuit, write margin technology, applied in the direction of instruments, static memory, digital memory information, etc., can solve the problems of weak unit write capability, increased chip cost, increased unit area, etc., and achieve the effect of good write performance

Active Publication Date: 2021-07-27
ANHUI UNIVERSITY
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this structure perfectly solves the problem of the P-I-N forward bias current of TFETs, stacking TFETs leads to very weak writing ability of the cells, and the cells cannot even be successfully written in the smallest size.
In order to realize the write function, the size of the transmission tube must be increased, resulting in an increase in unit area and an increase in chip cost

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • 9t TFET and MOSFET Hybrid SRAM Cell Circuit with High Write Margin
  • 9t TFET and MOSFET Hybrid SRAM Cell Circuit with High Write Margin
  • 9t TFET and MOSFET Hybrid SRAM Cell Circuit with High Write Margin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0021] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work fall within the protection scope of the present invention.

[0022] The basic device used in the traditional SRAM memory cell circuit is MOSFET, and the basic device used in the 9T TFET and MOSFET device hybrid SRAM cell circuit proposed by the present invention is a tunneling field effect transistor (TFET). Due to the shortcomings of the P-I-N forward bias current and the weak conduction capability of the stacked TFET, a method of combining the TFET and the MOSFET device for the SRAM cell transfer transistor in the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a 9T TFET and MOSFET device hybrid SRAM unit circuit with a high write margin. The overall structure of the unit adopts a read-write separation method. The main body of the unit circuit adopts a TFET device, and the transmission tube part adopts a TFET device. Combining with MOSFET devices not only overcomes the shortcoming of the weak transfer capability of stacked TFETs, but also avoids the P-I-N forward bias current problem that occurs when TFET devices are used as SRAM unit transfer tubes. The write ability of the unit is improved, and the static power consumption of the unit is reduced.

Description

technical field [0001] The invention relates to the technical field of integrated circuit design, in particular to a 9T TFET and MOSFET device hybrid SRAM cell circuit with high write margin. Background technique [0002] With the development of mobile electronic products, people's demand for low power consumption of integrated circuits has become more and more urgent. In recent years, MOSFET (Metal-Oxide Semiconductor Field Effect Crystal) has become an important part of digital integrated circuits and analog integrated circuits. However, with the development of integrated circuit technology nodes, the size of MOSFETs is gradually reduced. Due to the short channel effect of MOSFETs, their ability to turn off at sub-threshold voltages is weakened, resulting in increased static leakage current and static power consumption of the circuit. In microprocessors, static random access memory (SRAM) occupies more than 50% of the chip area and consumes most of the static power consum...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G11C11/412G11C11/417
CPCG11C11/412G11C11/417
Inventor 卢文娟董兰志彭春雨吴秀龙蔺智挺陈军宁
Owner ANHUI UNIVERSITY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products