Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

After-sun repair anti-allergy mask after outdoor cross-country and preparation method thereof

An after-sun repair and anti-allergic technology, which is applied in cosmetic preparations, skin care preparations, medical preparations containing active ingredients, etc., can solve the problem of limited therapeutic effect, single function, and inability to meet the needs of after-sun repair, etc. problem, to achieve safe use, less skin irritation, and reduce the effect of ultraviolet allergy symptoms

Active Publication Date: 2019-11-08
苏州榭睿迦医疗科技发展有限公司
View PDF2 Cites 5 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, most of the after-sun repair products on the market have single functions and limited therapeutic effects, which cannot meet the needs of after-sun repair after outdoor cross-country sports

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • After-sun repair anti-allergy mask after outdoor cross-country and preparation method thereof
  • After-sun repair anti-allergy mask after outdoor cross-country and preparation method thereof
  • After-sun repair anti-allergy mask after outdoor cross-country and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-5 and comparative example 1-5

[0027] Embodiment 1-5 and comparative example 1-5—raw material composition and preparation method of post-sun repair anti-allergic facial mask

[0028] An after-sun repair anti-allergic mask for outdoor off-roading, which is composed of a mask essence and a mask base material. The weight of the components contained in the mask essence is shown in Table 1-2, and is obtained by the following preparation method : S1. Weigh each raw material component by weight, and set aside; S2. Combine luteolin, peony root extract, Houttuynia cordata extract, Garcinia cambogia peel extract, dipropylene glycol, hydrogenated polyisobutylene, squalene Alkane and appropriate amount of deionized water are placed in the container according to the weight and stirred evenly to obtain mixture A; S3. Aloe vera leaf juice, hydroxyethyl cellulose, allantoin, phenoxyethanol and remaining deionized water Mix parts by weight and stir evenly to obtain mixture B; S4. Mix mixture A and mixture B and stir evenly ...

Embodiment 6

[0036] Efficacy evaluation was performed on the after-sun repairing anti-allergy facial masks in Examples 1-5 and Comparative Examples 1-5.

[0037] Subjects: 50 volunteers aged between 20 and 40 were selected from the outdoor cross-country club with similar degrees of sunburn (skin burning sensation, redness, and ultraviolet allergy).

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides an after-sun repair anti-allergy mask after outdoor cross-country and a preparation method thereof. The after-sun repair anti-allergy mask is prepared from the raw material: luteolin, peony albiflora root extract, herba houttuyniae extract, aloe leaf juice, garcinia cambogia peel extract, hydroxyethyl cellulose, allantoin, dipropylene glycol, hydrogenated polyisobutylene, squalane, phenoxyethanol and deionized water. The five plant active ingredients-luteolin, peony albiflora root extract, herba houttuyniae extract, aloe leaf juice, garcinia cambogia peel extract and other mask nutrients are mixed in a certain proportion as a mask essence, and a remarkable after-sun repair effect is achieved. Tests have shown that the five plant active ingredients have synergistic effects, excellent after-sun repair and anti-allergy effects can be achieved, and skin sunburn and allergy symptoms after outdoor cross-country sports can be effectively improved.

Description

technical field [0001] The invention belongs to the technical field of daily chemical products, and in particular relates to an after-sun repairing anti-allergy facial mask for outdoor off-roading and a preparation method thereof. Background technique [0002] Outdoor trail running is a very popular sport nowadays. Many people will choose to participate in long-distance trail running when challenging their physical limits, which can test their physical fitness and endurance. Sunburn should be a problem that most outdoor trail running enthusiasts have encountered. In mild cases, the skin becomes red, with obvious sun marks, accompanied by a burning sensation; The probability of the immune system, and even shock, induce various skin diseases and even skin cancer. Many scientific experiments have proved that even in cloudy days, the irradiation rate of ultraviolet rays is 81%-95% of that in sunny days, and even in rainy days, there are 21%-54% of ultraviolet rays. When runnin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9794A61K8/9789A61K8/49A61Q19/00
CPCA61K8/498A61K2800/592A61K2800/5922A61Q19/004A61Q19/005A61K8/9789A61K8/9794
Inventor 许可张宏宇肖健
Owner 苏州榭睿迦医疗科技发展有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products