Semiconductor device and manufacturing method thereof
A semiconductor and device technology, applied in the field of power semiconductor devices, can solve problems such as low breakdown voltage and low constant current value, achieve high withstand voltage, improve dynamic impedance value, and excellent constant current characteristics
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2019-12-03
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Abstract
Description
technical field
[0001] The invention belongs to the technical field of power semiconductor devices, and in particular relates to a semiconductor device and a manufacturing method thereof. Background technique
[0002] Constant current source is a commonly used electronic equipment and device, and it is widely used in electronic circuits. The constant current source is usually used to protect the entire circuit, even if the voltage is unstable or the load resistance value changes greatly in the circuit, it can still ensure the stability of the supply current of the entire circuit. Constant Regulating Diode (CRD, Constant Regulating Diode) is a commonly used semiconductor constant current device. The diode is used as a constant current source instead of an ordinary constant current source composed of multiple electronic components such as transistors, Zener tubes, and resistors to realize the circuit structure. Simplicity and miniaturization. At present, the output current o...
Examples
Embodiment Construction
[0044] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.
[0045] As shown in Figure 1(a), a semiconductor device provided by the first embodiment of the present invention is formed by connecting multiple cells with the same structure in an interdigitated manner, and the cell structure includes a second conductivity type lightly doped Substrate 1, first conductivity type lightly doped epitaxial layer 2, oxide medium layer 10, metal cathode 11, metal anode 12 and back metal electrode 13; the first conductivity type lightly doped epitaxial layer 2 has diffused second conductivity type The well region 3, the first conductivity type depletion channel region 8, the first heavily doped region 5, the second heavily doped region 6 and the third heavily doped region 7, the first heavil...