Alignment method for maskless laser direct writing lithography equipment in production of sheet-to-roll
A technology of laser direct writing and lithography equipment, which is applied in microlithography exposure equipment, optomechanical equipment, optics, etc., can solve problems such as overshoot and production interruption, and achieve the effect of saving time and strengthening the ability of information transmission
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[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments It is a part of embodiments of the present invention, but not all embodiments.
[0031] Such as figure 1 As shown, the alignment method of the maskless laser direct writing lithography device in the embodiment of the present invention when producing sheet-to-roll, based on the roll-to-roll maskless laser direct writing lithography device, includes the following steps:
[0032] In the sheet-to-roll production mode, the alignment starts after automatically searching for the alignment target;
[0033] Using the alignment result of the last piece, calculate the accumulative board-in error, automatically correct the alignment parame...
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