Negative resistance type GaN pressure sensor and preparation method thereof
A technology of pressure sensor and negative resistance, which is applied in the field of negative resistance GaN pressure sensor and its preparation, which can solve the problems of distortion, slow pressure response, and small capacitance and piezoelectric variation coefficient, and achieve low voltage, fast response speed, and high response The effect of sensitivity
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[0033] The technical solutions of the present invention will be clearly and completely described below in conjunction with the accompanying drawings. Apparently, the described embodiments are some of the embodiments of the present invention, but not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without making creative efforts belong to the protection scope of the present invention.
[0034] This embodiment provides a novel gate-controlled PIN structure GaN ultraviolet detector and its preparation method. The profile of the device is as follows: figure 1 As shown, it consists of Si substrate 1, GaN buffer layer 2, n-type GaN layer 3, AlGaN layer 4, GaN layer 5, AlGaN layer 6, n-type GaN layer 7, aluminum oxide passivation layer 8, upper metal electrode 9 and the lower metal electrode 10.
[0035] Such as figure 1 As shown in a, in the double barrier AlGaN / GaN / AlGaN quantum well structure,...
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