Exposure method and device for a liquid crystal computed hologram

Abstract

The invention provides an exposure method and device for a liquid crystal computer-generated hologram, which can avoid a problem of a mask exposure method adopted for manufacturing the liquid crystalcomputer-generated hologram at present, simplify the manufacturing process, reduce manufacturing cost, shorten a distance between a mask and a substrate to be exposed, and reduce damage to a photosensitive material on the surface of the substrate. The method comprises steps of (1) constructing a liquid crystal computer-generated hologram exposure device without adding a plane mirror and a spatiallight modulator; (2) putting the to-be-exposed substrate coated with a photosensitive material and adjusting parameters; (3) carrying out first exposure; (4) adding the plane mirror and the spatial light modulator into an exposure device, performing parameter adjustment of the plane mirror, the spatial light modulator and the to-be-exposed substrate, and adjusting input parameters of the spatial light modulator to enable the spatial light modulator to modulate incident plane light waves into light waves with expected wavefront; and (5) carrying out secondary exposure.

Description

technical field [0001] The invention relates to the technical field of optical precision manufacturing, in particular to an exposure method for a liquid crystal calculation hologram and an exposure device for a liquid crystal calculation hologram. Background technique [0002] Computational holography is an aspheric detection method, which belongs to a kind of zero compensation interferometry, and the zero compensation device used in it is a calculation hologram. Computational hologram is a kind of diffraction element, theoretically, it can realize mutual conversion between spherical wave and arbitrary aspheric wave through the principle of diffraction. Liquid crystal computed hologram is a new type of computed hologram, based on the birefringence characteristics of liquid crystals, the fabrication of computed holograms is realized through liquid crystal optically controlled orientation technology. [0003] There are many steps in the production of liquid crystal computed h...

AI Technical Summary

Problems solved by technology

Otherwise, if the gap between the mask and the substrate surface is too large, the optical path will shift due to diffraction and other reasons after the light passes through the mask, and the photosensitive materials that should not be exposed in the opaque area of ​​the mask will also be affected. exposure, resulting in failure to obtain a liquid crystal computed hologram of the expected pattern

In addition, in the mask exposure method, the surface of the substrate needs to be in contact with the mask over a large area, which may cause damage to the photosensitive material layer coated on the surface of the substrate.

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