Logo deplating process

A stripping and process technology, applied in metal material coating process, sputtering plating, ion implantation plating and other directions, can solve the problems of increasing energy waste and operation risks, reducing stripping efficiency, and long stripping time, etc. To achieve the effect of automatic operation, good de-plating effect and reduction of operation risk

Active Publication Date: 2020-03-10
LENS TECH
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In addition, there are other deplating processes. Although existing such technologies can remove PVD film and protective ink when deplating products, they also have the following defects: 1. High deplating temperature: increase energy Waste and operation risk; 2. Long deplating time: reduce deplating efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Logo deplating process

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0037] A logo deplating process, especially suitable for the silver logo deplating of the glass back cover. The equipment used in this method is specifically an ultrasonic cleaning machine. The ultrasonic cleaning machine manufacturer is Shenzhen Hekeda Ultrasonic Equipment Co., Ltd., and the model is HKD- 103240STGF; the PVD film layer used for the silver logo on the glass back cover is aluminum and titanium; the surface oxide of the PVD film layer is aluminum oxide and titanium oxide; the protective ink is provided by Japan Seiko Ink Co., Ltd., and the protective ink is included in mass percentage The following components: xylene accounts for 2.9%, isobutanol accounts for 5%, ethyl acetate accounts for 4.5%, carbon black accounts for 10%, epoxy resin accounts for 76.6%, and the balance additives.

[0038] Include the following steps:

[0039] The first step is to put the product into the deplating solution A and soak it to remove the oxide on the surface of the PVD film;

...

Embodiment 2

[0051] The difference between this embodiment and Example 1 is: when the stripping solution A is stripping the product: the temperature is 15°C, and the stripping time is 30s; when the stripping solution B is stripping the product: the temperature is 15°C. ℃, and the deplating time is 150s; when the deplating solution C deplates the product: the temperature is 70°C, and the deplating time is 300s; the ultrasonic current of the ultrasonic cleaning machine is 2.0 amperes.

Embodiment 3

[0053] The difference between this embodiment and Example 1 is: when the stripping solution A is stripping the product: the temperature is 25°C, and the stripping time is 60s; when the stripping solution B is stripping the product: the temperature is 25°C. °C, the deplating time is 180s; when the deplating solution C is deplating the product: the temperature is 90°C, and the deplating time is 360s; the ultrasonic current of the ultrasonic cleaning machine is 4.0 amperes.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a Logo deplating process. The Logo deplating process comprises the following steps that S1, a product is put into a deplating solution A and soaked to remove the surface oxide of a PVD film layer; S2, the product is put into a deplating solution B and soaked to remove the PVD film layer; S3, the product is put into in a deplating solution C and soaked to remove protective ink; and S4, the soaked product is cleaned to obtain the deplated product. The deplating solution A is prepared from, by mass, 10%-20% of inorganic base, 1%-2% of carbonate, 1%-3% of assistant and the balance water. By adopting the deplating process, a very good deplating effect can be achieved, automatic operation can be achieved, and the product yield is kept to be about 88%; and the deplating solutions A, B and C are low in temperature and short in deplating time when the product is deplated. Therefore, the energy can be saved, the operation risk can be reduced, and the deplating efficiency can be improved.

Description

technical field [0001] The invention relates to the technical field of Logo processing, in particular to a Logo stripping process. Background technique [0002] With the progress of society, glass has been used as the back cover of mobile phones, and it has become a fashion. Compared with traditional plastic and metal mobile phone back covers, the glass back cover has the advantages of lightness, transparency, anti-fingerprint, anti-glare, and strong signal transmission. Etc. The traditional logo method adopts the method of printing silver ink or electroplating aluminum and then printing ink. The Logo produced by this method is not beautiful, with large steps and no metal texture. Later, the hollowing process was used to prepare the Logo: silk screen printing protection ink; cleaning; electroplating aluminum and titanium; deplating protection ink. The new logo preparation method adopts a solid process: electroplating aluminum and titanium; then silk screen printing to prot...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/58C23F1/36C23F1/38C03C23/00C09D9/00
CPCC23C14/5873C23F1/36C23F1/38C03C23/0075C09D9/00
Inventor 周群飞吴遇青
Owner LENS TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products