Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Improved PCA face recognition algorithm capable of resisting illumination influence

A face recognition and anti-illumination technology, applied in the field of improving PCA face recognition algorithm, can solve the problems of large influence of image illumination changes, description noise and redundancy, and low PCA recognition rate, so as to improve the recognition rate and reduce the impact. Effect

Pending Publication Date: 2020-04-10
青岛中科智保科技有限公司
View PDF3 Cites 1 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The realization of traditional PCA requires a lot of assumptions in theory, which makes it impossible to effectively identify theoretically in many cases.
First of all, the traditional PCA algorithm requires the standard training matrix to conform to the Gaussian distribution. When the probability distribution of the investigated data does not satisfy the Gaussian distribution, the variance and covariance cannot be used to properly describe the noise and redundancy, and the training space cannot be well reflected. The feature subspace of , which will inevitably make the recognition rate of PCA relatively low
[0006] 1. The probability distribution of the investigated data does not satisfy the Gaussian distribution and cannot resist the influence of noise;
[0007] 2. The image is greatly affected by illumination changes. Traditional PCA does not consider the influence of illumination, and the weight of the feature vector is the same

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Improved PCA face recognition algorithm capable of resisting illumination influence
  • Improved PCA face recognition algorithm capable of resisting illumination influence
  • Improved PCA face recognition algorithm capable of resisting illumination influence

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] In order to make the technical solutions and advantages of the present invention clearer, the technical solutions of the present invention will be described clearly and completely in conjunction with specific embodiments and drawings. Obviously, the described embodiments are a part of the embodiments of the present invention. Not all the embodiments; based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative work shall fall within the protection scope of the present invention.

[0046] Such as figure 1 As shown, the embodiment of the present invention provides an improved PCA face recognition algorithm that resists the influence of illumination, including the following steps:

[0047] (1) Select the training sample set. The training sample set includes multiple face targets. Each face target selects s ​​images as the training sample, and each image is written as a column vector and arranged into a ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention belongs to the field of image processing, and discloses an improved PCA (Principal Component Analysis) face recognition algorithm capable of resisting illumination influence, which comprises the following steps of: (1) selecting a training sample set; (2) classifying according to the angle and illumination of the image, and dividing the image data into a plurality of sub-data sets; (3) calculating a mean vector, a centralized data matrix and a covariance matrix of all the sub-data sets; (4) calculating eigenvalues of the covariance matrix, selecting k maximum eigenvalues from theeigenvalues, and solving eigenvectors corresponding to the k maximum eigenvalues; adding a weight coefficient to each feature vector, and arranging the feature vectors into a transformation matrix Waccording to columns; (5) calculating projection matrixes of all images in the training sample set and storing the projection matrixes; and (6) calculating a projection matrix of a to-be-recognized face, and traversing projection matrixes of all head portraits in the search sample training set for matching calculation to obtain a matching result. The method can reduce the illumination influence, and improves the recognition rate.

Description

Technical field [0001] The invention belongs to the field of image processing, and in particular relates to an improved PCA face recognition algorithm resistant to the influence of illumination. Background technique [0002] PCA (Principal Component Analysis), also known as principal component analysis, is a commonly used effective method for processing, compressing and extracting information based on the variable covariance matrix. Its basic principle is to use K-L transformation to extract the main components of the face to form a characteristic face space. During recognition, the test image is projected into this space to obtain a set of projection coefficients, which are then compared with each face image for recognition. [0003] The K-L transformation uses an orthogonal matrix composed of the normalized orthogonal eigenvectors of the covariance matrix of the original data as the transformation matrix to achieve data compression in the transformation domain. It has the charac...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06K9/00G06K9/62
CPCG06V40/172G06F18/2135
Inventor 王海涛苏南溪
Owner 青岛中科智保科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products