Method for manufacturing substrate with electrodes formed thereon
A manufacturing method and electrode substrate technology, which is applied in cable/conductor manufacturing, chemical instruments and methods, circuits, etc., can solve problems such as poor moiré ripples and position offsets, and achieve the effects of suppressing moiré ripples and excellent positional accuracy
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[0083] Hereinafter, examples are given to illustrate the present invention in further detail, but the present invention is not limited to these.
[0084] The materials used in each example are as follows. In addition, the transmittance of the transparent substrate at a wavelength of 550 nm was measured using an ultraviolet-visible spectrophotometer (U-3310 (made by Hitachi High-Technology Co., Ltd.)).
[0085] (Transparent substrate)
[0086] · "ルミラー" (registered trademark) T60 (manufactured by Toray Co., Ltd.) (thickness: 100 μm, transmittance at wavelength 550 nm: 89%) (a-1)
[0087] · "Seomex" (registered trademark) 480 (manufactured by Nippon Konon Co., Ltd.) (thickness: 100 μm, transmittance at a wavelength of 550 nm: 92%) (a-2).
manufacture example 1
[0088] (Production Example 1: Acrylic copolymer containing carboxyl group)
[0089] 150 g of diethylene glycol monoethyl ether acetate (hereinafter, "DMEA") was added to a reaction vessel in a nitrogen atmosphere, and the temperature was raised to 80°C using an oil bath. To this was added dropwise over 1 hour from 20 g of ethyl acrylate (hereinafter, "EA"), 40 g of 2-ethylhexyl methacrylate (hereinafter, "2-EHMA"), and 20 g of styrene (hereinafter, " St"), 15 g of acrylic acid (hereinafter, "AA"), 0.8 g of 2,2-azobisisobutyronitrile, and 10 g of diethylene glycol monoethyl ether acetate. After completion of the dropwise addition, it was further stirred for 6 hours to proceed the polymerization reaction. Then, 1 g of hydroquinone monomethyl ether was added to stop the polymerization reaction. Next, a mixture composed of 5 g of glycidyl methacrylate (hereinafter, "GMA"), 1 g of triethylphenylammonium chloride, and 10 g of DMEA was added dropwise over 0.5 hours. After the dropwis...
manufacture example 2
[0090] (Manufacturing Example 2: Photosensitive conductive paste)
[0091] In a 100 mL clean bottle, 17.5 g of the carboxyl group-containing acrylic copolymer obtained in Production Example 1, 0.5 g of photopolymerization initiator N-1919 (manufactured by ADEKA), and 1.5 g of epoxy resin "Adeka Rejin" (Registered trademark) EP-4530 (epoxy equivalent 190, manufactured by ADEKA), 3.5 g of monomer "Rait Acryret" (registered trademark) BP-4EA (manufactured by Kyoeisha Chemical Co., Ltd.) and 19.0 g DMEA was mixed by using "Kawatori Taro" (registered trademark) ARE-310 (manufactured by Shinke Co., Ltd.) to obtain 42.0 g of a resin solution. The 42 g of the resin solution obtained was mixed with 62.3 g of silver particles with a primary particle size of 0.4 μm. After kneading with a three-roll EXAKT M50 (manufactured by EXAKT), 7 g of DMEA was further added and mixed to obtain 111 g of photosensitive conductive material. paste. The viscosity of the photosensitive conductive paste is ...
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