A Magnetic Circuit Controllable Vacuum Cathode Arc Ion Source

Abstract

The invention discloses a magnetic circuit controllable vacuum cathode arc ion source, which comprises an arc ion source shell, a cathode target seat, a cathode target and a magnet are installed in the arc ion source shell, and the cathode target is fixed on the cathode target seat; A yoke is installed on the outer wall of the source housing; the yoke is composed of a cylindrical yoke A with a top surface and a circular yoke B; the yoke B is installed inside the yoke A, and the two are in contact; the yoke A There is a free tolerance fit between the housing of the arc ion source and can slide along the housing of the arc ion source. The position of the yoke of the arc source can be adjusted. By adjusting the position of the yoke, the magnetic field strength of the cathode target surface can be adjusted, and the configuration distribution of the magnetic field on the cathode target surface can be optimized simultaneously.

Description

technical field [0001] The invention belongs to the technical field of vacuum coating, in particular to a magnetic circuit controllable vacuum cathode arc ion source. Background technique [0002] Vacuum cathodic arc ion plating has become one of the leading technologies for physical vapor deposition (PVD) coatings in the current industrial field. layer, it uses the metal material as the cathode in the vacuum chamber, and through the arc discharge between the anode shell, the target material is evaporated and ionized to form a space plasma, and the coating material is coated on the surface of the workpiece, which can greatly Greatly improve the performance and service life of the workpiece. [0003] When the cathode arc spot is working, in addition to producing metal atoms and ions, it also produces large metal particles. The problem of large particles is the bottleneck problem that hinders the further extensive and in-depth application of arc ion plating technology. Becau...

AI Technical Summary

Problems solved by technology

Although this method can ensure the consistency of the magnetic field intensity on the target surface by adjusting the distance between the target surface and the magnetic field components according to the ablation consumption of the target surface, the configuration distribution of the magnetic field is difficult to adjust and change, and a single magnetic field configuration will also affect the The arc spot will be etched in a local area, which will cause the target utilization rate to decrease, the discharge will be uneven, the arc current will be unstable, the deposition rate will change, and the coating performance will be inconsistent.

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