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Auxiliary equipment for new wafer semiconductor production

A production auxiliary and semiconductor technology, which is applied in the manufacture of semiconductor/solid-state devices, cleaning methods using liquids, cleaning methods and utensils, etc., can solve the problems of inability to clean in large quantities and low cleaning efficiency, so as to improve adaptability and ensure cleaning efficiency and cleaning quality

Active Publication Date: 2021-11-23
ZHEJIANG LANTE OPTICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The present invention can reduce the accumulation of particles on the surface of the brush body, and can further improve the self-cleaning ability of the brush body, but for example, the above-mentioned wafer cleaning device and most of the cleaning devices on the market cannot be cleaned in large quantities, which will lead to low cleaning efficiency , so there is an urgent need for a wafer cleaning device that can clean a large amount of

Method used

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  • Auxiliary equipment for new wafer semiconductor production
  • Auxiliary equipment for new wafer semiconductor production
  • Auxiliary equipment for new wafer semiconductor production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] Example 1: Please refer to figure 1 , 2 , 3, 4 and Figure 5 , a new type of wafer semiconductor production auxiliary equipment, including a cleaning box 1, a cleaning frame 15 is arranged inside the cleaning box 1, a water leakage hole is opened on the surface of the cleaning frame 15, and a rectangular cover plate 12 is hinged on the upper end of the inner wall of the cleaning frame 15, The upper surface of the cleaning frame 15 is fixedly connected with a handle 14, and the bottom plate of the cleaning frame 15 is equidistantly and uniformly fixedly connected with a rectangular baffle plate 17, and the bottom plate of the cleaning frame 15 is equidistantly evenly provided with a rectangular through hole 16, and the inner wall of the cleaning box 1 A rectangular concave hole 18 is recessed in the middle of both sides of the left and right sides. A rinsing device is arranged inside the cleaning box 1. The rinsing device includes a motor 22 and a rinsing plate 2. The r...

Embodiment 2

[0040] Example 2: Please refer to Image 6 , on the basis of embodiment one, the lower surface of cleaning box 1 is provided with a circulation device, and described circulation device comprises filter box 3 and L-shaped pipe 32, and the upper surface of described filter box 3 and the lower surface of cleaning box 1 Fixedly connected together, the filter box 3 communicates with the cleaning box 1 through a vertical pipe 33, the inner bottom of the filter box 3 is provided with a water pump, the left end of the L-shaped pipe 32 is connected to the filter box 3 The lower end on the right side of the filter is fixedly connected together, the L-shaped pipe 32 communicates with the inside of the filter box 3, the upper end water outlet of the L-shaped pipe 32 stretches into the inner upper end of the cleaning tank 1, and the left end of the L-shaped pipe 32 is connected to the filter box 3. The output ends of the water pump are fixedly connected together, and an automatic filter de...

Embodiment 3

[0046] Example 3: Please refer to Figure 7 , on the basis of Embodiment 2, an automatic collection device is provided inside the filter box 3, the automatic collection device includes two collection boxes 31 and a rectangular vertical rod 42, the left and right sides of the filter box 3 are all opened There is a rectangular through hole, and the two collection boxes 31 are respectively located inside the two collection boxes 31, and the side surfaces of the two collection boxes 31 are provided with water leakage holes, and each of the water leakage holes is fixed. A filter screen is connected, and a rectangular chute 41 is provided on the front and rear sides of the upper surface of the filter plate 4, and a roller 43 is fixedly connected to the front and rear ends of the lower surface of the rectangular longitudinal bar 42, and the two rollers 43 are correspondingly inserted into two rectangular chute 41 respectively, and the two collection boxes 31 are respectively located ...

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PUM

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Abstract

The invention relates to the field of wafer semiconductor technology, and discloses a new type of wafer semiconductor production auxiliary equipment, including a cleaning box, a cleaning frame is arranged inside the cleaning box, a water leakage hole is opened on the surface of the cleaning frame, and the upper end of the inner wall of the cleaning frame is hinged. A rectangular cover plate, the upper surface of the cleaning frame is fixedly connected with handles, and the bottom plate of the cleaning frame is fixedly connected with rectangular baffles at equal distances. This new auxiliary equipment for wafer semiconductor production drives the rotation of the rotating shaft through the rotation of the motor, and the rotation of the rotating shaft The rotation drives the rotation of the cam to cooperate with the arc rod, so that the arc rod can move up and down. The wafers inside the frame are cleaned by shaking up and down. This way of rinsing can not only use large-scale cleaning, but also make the wafers cleaner.

Description

technical field [0001] The invention relates to the technical field of wafer semiconductors, in particular to novel wafer semiconductor production auxiliary equipment. Background technique [0002] Wafer refers to the silicon wafer used in the production of silicon semiconductor integrated circuits. Because of its round shape, it is called wafer. Wafer is the basic material for manufacturing semiconductor chips. The main raw material of semiconductor integrated circuits is silicon, so the corresponding It's a silicon wafer. [0003] The manufacturing process of the wafer is surface cleaning, initial oxidation, thermal CVD, heat treatment, etc. During the production of wafer semiconductors, the step of wafer cleaning is often handled by production auxiliary equipment. For example, a Chinese patent discloses a patent No. CN109037116A , Wafer cleaning device, the present invention relates to a wafer cleaning device, including a cleaning assembly symmetrically arranged on both ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B08B3/10B08B3/14B08B1/02B08B13/00H01L21/67B08B1/20
CPCB08B3/10B08B3/14B08B3/044B08B3/047B08B13/00H01L21/67057B08B1/20
Inventor 吴明俞伟
Owner ZHEJIANG LANTE OPTICS