Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Monolithic integrated dual-wavelength semiconductor laser and its preparation method

A monolithic integration, laser technology, applied in the direction of semiconductor lasers, semiconductor laser devices, optical waveguide semiconductor structures, etc. Effect

Active Publication Date: 2021-01-29
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] A common semiconductor laser is a PN junction structure or a PIN junction structure, and its lasing wavelength is directly affected by the material and structure of the active region. Although the gain peak of a semiconductor laser is relatively wide, it can achieve a tuning excitation of more than ten nanometers or even a hundred nanometers. But its lasing wavelength basically floats in a fixed wavelength range, that is, it can only work in a single wavelength range. In the fields of gas monitoring and laser processing, lasers with different wavelengths need to be matched for different gases and processing materials. In order to obtain multiple The current method is to configure multiple semiconductor lasers with different chips. Since each semiconductor laser requires a separate pump source and cooling device, the volume and weight of the entire device will increase linearly.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Monolithic integrated dual-wavelength semiconductor laser and its preparation method
  • Monolithic integrated dual-wavelength semiconductor laser and its preparation method
  • Monolithic integrated dual-wavelength semiconductor laser and its preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0045] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0046]It should be noted that, in the drawings or descriptions of the specification, similar or identical parts all use the same figure numbers. Implementations not shown or described in the accompanying drawings are forms known to those of ordinary skill in the art. Additionally, while illustrations of parameters including particular values ​​may be provided herein, it should be understood that the parameters need not be exactly equal to the corresponding values, but rather may approximate the corresponding values ​​within acceptable error margins or design constraints. In addition, the directional terms mentioned in the following embodiments, such as "upper", "lower", "left", "right", "front", "rear", etc., are only ref...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a single-chip integrated dual-wavelength semiconductor laser and a preparation method thereof, belonging to the technical field of semiconductor lasers. The semiconductor laser includes: a first laser, a second laser, a first isolation groove and a second isolation groove, the first laser includes a first laser P electrode, and the second laser includes a second laser P electrode and a second laser Bridge electrode; wherein, the second laser P electrode is located between the first laser P electrode and the second laser bridge electrode, and the first isolation groove is prepared between the first laser P electrode and the second laser P electrode; the The second isolation groove is prepared between the P electrode of the second laser and the bridge electrode of the second laser. In the present invention, the two lasers can work simultaneously or separately through the special design of the current of the two lasers and the isolation groove.

Description

technical field [0001] The invention relates to the field of semiconductor lasers, in particular to a single-chip integrated dual-wavelength semiconductor laser and a preparation method thereof. Background technique [0002] Semiconductor lasers have the advantages of high output power, small size, light weight, and high photoelectric conversion efficiency, especially semiconductor edge-emitting lasers have great advantages in high efficiency, high power, and gas detection. [0003] A common semiconductor laser is a PN junction structure or a PIN junction structure, and its lasing wavelength is directly affected by the material and structure of the active region. Although the gain peak of a semiconductor laser is relatively wide, it can achieve a tuning excitation of more than ten nanometers or even a hundred nanometers. But its lasing wavelength basically floats in a fixed wavelength range, that is, it can only work in a single wavelength range. In the fields of gas monitor...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/32H01S5/20H01S5/40
CPCH01S5/2009H01S5/32H01S5/40
Inventor 杨成奥牛智川张宇徐应强谢圣文张一尚金铭黄书山袁野苏向斌邵福会
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products