Semiconductor package and method for producing same
A manufacturing method and semiconductor technology, applied in semiconductor/solid-state device manufacturing, semiconductor devices, semiconductor/solid-state device components, etc., can solve problems such as uneven surface pressure and inability to perform uniform heat dissipation, and achieve the effect of improving productivity
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Embodiment approach 1
[0038]
[0039] figure 1 It is a cross-sectional view showing the structure of the semiconductor package 100 in Embodiment 1 according to the present invention. Such as figure 1 As shown, in the semiconductor package 100, the principal surfaces of the semiconductor chip 11 (first semiconductor chip) and the semiconductor chip 12 (second semiconductor chip) are die-bonded to tubes of the heat sink 3 (radiation member) via the bonding layer 2, respectively. On core joints 21 and 22 (first and second joints).
[0040] The active surfaces of the semiconductor chips 11 and 12, which are the main surfaces opposite to the main surface on which the die is bonded to the bonding layer 2, are respectively flip-chip mounted on the first main surface (upper surface) of the interposer 5 which is an insulating substrate. A plurality of inner bumps 41 on the surface). In addition, a plurality of outer bumps 42 are provided on the second main surface (lower surface) of the interposer subs...
Deformed example 1
[0085] In the semiconductor package 100 of Embodiment 1 described above, a stepped structure having a difference in height between the two die-bonding parts of the heat sink 3 is used to cope with the semiconductor chips 11 and 12 having different thicknesses. Different semiconductor chips use bumps of different sizes and can also cope with differences in thickness.
[0086] That is, if Figure 11 As in the shown semiconductor package 100A, the semiconductor chip 11 with a thickness of 0.4 mm is bonded to the inner bump 411 (bonding material) with a diameter of 0.3 mm, and the semiconductor chip 12 with a thickness of 0.2 mm is bonded to the inner bump 412 with a diameter of 0.5 mm. (bonding material), the heat sink 3A in which the die-bonding portions 21 and 22 each have a thickness of 2 mm can be used. By using bumps with different diameters, that is, different heights, there is no need to provide a height difference between the two die-bonding parts, so it is possible to u...
Deformed example 2
[0089] In the semiconductor package 100 according to Embodiment 1, the height of the gap between the heat sink 3 and the interposer 5 is determined by the height of the inner bumps 41 arranged on the interposer 5, but it is also possible to provide a device for setting the gap length. support body.
[0090] That is, it can also be used as Figure 12 Like the illustrated semiconductor package 100B, a protrusion 33 extending from between the die-bonding portion 21 and the die-bonding portion 22 of the heat sink 3B toward the interposer substrate 5 side is provided, and its tip is in contact with the main surface of the interposer substrate 5 . , and is bonded to the interposer substrate 5 by using the bonding portion 413 of solder or resin.
[0091] By providing the protruding portion 33 , the height of the protruding portion 33 can be used to more accurately set the length of the gap between the heat sink 3B and the interposer substrate 5 . In addition, by providing a portion...
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Abstract
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