Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Arbitrary shape grating simulation system based on ZEMAX

A technology of arbitrary shape and simulation system, applied in the direction of design optimization/simulation, etc., can solve problems such as no geometric imaging optimization system, unsuitable imaging system design and optimization, lack of shape grating simulation model, etc., to reduce simulation time consumption and avoid Effect of repeated calculation and improvement of simulation efficiency

Pending Publication Date: 2020-08-21
SOUTHEAST UNIV
View PDF2 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, research institutions at home and abroad use the finite element method of COMSOL Multiphysics to simulate the diffraction characteristics of gratings with arbitrary shapes. This method can achieve high-precision numerical simulation. However, COMSOL does not have a systematic geometric imaging optimization system, which is not suitable for the design of imaging systems. and optimization
Commonly used optical simulation software such as ZEMAX and TracePro can realize the design, analysis, optimization and other auxiliary functions of optical imaging systems, but only support simple surface grating simulation, and lack the simulation model of arbitrary shape gratings

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Arbitrary shape grating simulation system based on ZEMAX
  • Arbitrary shape grating simulation system based on ZEMAX
  • Arbitrary shape grating simulation system based on ZEMAX

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] Embodiment 1: see figure 1 —3, a ZEMAX-based arbitrary shape grating simulation system, including a search module, a database module, an interpolation module, a calculation module, an acceleration method and a dynamic link library interface, wherein:

[0023] The search module and the database module form a data query system, and the diffraction parameter sets that may be used in the simulation calculation and the corresponding diffraction characteristics form a key-value search pair, which is stored in the database module. During the simulation process, the search module is called to query the actual simulation parameters. diffraction properties. This method can reuse a large number of similar diffraction parameter situations, avoiding a large number of repeated calculations and improving the simulation efficiency. The search module corresponds to the database module, and the data records can be saved in the local library file. The records are sorted according to the...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses an arbitrary shape grating simulation system based on ZEMAX. The system comprises a dynamic link library (DLL) interface, a calculation module, an acceleration method, a database module, a search module and an interpolation module, wherein the dynamic link library interface is used for embedding an algorithm into optical simulation software ZEMAX, so that the ZMEAX can calla self-defined grating model; a theoretical model adopts three-dimensional rigorous coupled wave analysis (RCWA) and is used for calculating diffraction characteristics of gratings in any shape undergiven parameters; the acceleration method uses the GPU acceleration principle, achieves rapid operation of RCWA through the powerful parallel operation capacity of a GPU, and the purpose of preliminarily accelerating an optimization algorithm; the database module is composed of a plurality of records, each record is marked by a diffraction parameter set, and diffraction characteristics under given parameters are recorded; the search module adopts a hash table method and is used for quickly searching for records corresponding to given parameters to realize further acceleration of a simulationalgorithm; and the interpolation module is used for calculating diffraction characteristics of non-recording parameters. The model can quickly calculate the diffraction characteristics of the gratingunder given parameters, and can be applied to ZEMAX to realize ray tracing imaging simulation.

Description

technical field [0001] The invention relates to a ZEMAX-based grating simulation system of arbitrary shape. Background technique [0002] Near-eye display technology, especially holographic waveguide display technology, has made great progress and has attracted widespread attention at home and abroad. To achieve high-performance slim designs, diffractive optical elements (DOEs), represented by gratings, have been widely adopted and studied as coupling elements for waveguide near-eye displays. [0003] At present, research institutions at home and abroad use the finite element method of COMSOL Multiphysics to simulate the diffraction characteristics of gratings with arbitrary shapes. This method can achieve high-precision numerical simulation. However, COMSOL does not have a systematic geometric imaging optimization system, which is not suitable for the design of imaging systems. and optimization. Commonly used optical simulation software such as ZEMAX and TracePro can real...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/20
Inventor 张宇宁刘皓天
Owner SOUTHEAST UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products