Wavelength tracking system, method to calibrate a wavelength tracking system, lithographic apparatus, method to determine an absolute position of a movable object, and interferometer system
A technology of tracking system and interferometer, which is applied in the field of wavelength tracking system, calibration wavelength tracking system, lithography equipment, determining the absolute position of movable objects, and interferometer system, and can solve problems such as complex structures
Pending Publication Date: 2020-09-15
ASML NETHERLANDS BV
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- Application Information
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Problems solved by technology
Such an optical differential interferometer requires a relatively complex structure with multiple polarizing beam splitters, corner cubes, etc.
This results in relatively long optical paths with long glass lengths
[0012] Another disadvantage of the most known interferometers is that the interferometer is only able to determine the relative displacement of the movable object with respect to a reference part
Method used
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Embodiment Construction
[0063] figure 1 A lithographic apparatus according to an embodiment of the present invention is schematically depicted. The device includes an illumination system IL, a support structure MT, a substrate table WT, and a projection system PS.
[0064] The illumination system IL is configured to condition the radiation beam B. The support structure (for example, a mask table) is configured to support a patterning device MA (for example, a mask), and is connected to a first positioning device PM, which is configured according to certain parameters Position the patterning device accurately. The substrate table WT (for example, a wafer table) is configured to hold a substrate W (for example, a resist coated wafer) W, and is connected to a second positioning device PW, the second positioning device PW It is configured to accurately position the substrate according to certain parameters. The projection system PS is configured to project the pattern imparted to the radiation beam B ont...
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Abstract
The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receivethe first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the firstsensor signal and the second sensor signal.
Description
[0001] Cross references to related applications [0002] This application claims the priority of European application 18154460.2 filed on January 31, 2018 and European application 18197177.1 filed on September 27, 2018, the entire contents of these European applications are incorporated herein by reference. Technical field [0003] The first aspect of the present invention relates to a wavelength tracking system, a method of calibrating the wavelength tracking system, and a lithographic apparatus. [0004] The second aspect of the present invention relates to a method of using an interferometer system to determine the absolute position of a movable object relative to a reference site. The second aspect of the present invention also relates to an interferometer system that performs such a method, and a lithographic apparatus including such an interferometer system. Background technique [0005] A lithographic apparatus is a machine that applies a desired pattern to a substrate (usuall...
Claims
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IPC IPC(8): G01B9/02G03F7/20G01J9/02
CPCG01J9/0246G03F7/70725G01J2009/0261G01B11/002G03F7/0002G01B9/02007G01B9/02002G01B9/02028
Inventor E·A·F·范德帕斯奇M·J·詹森S·J·A·G·科西晋斯K·G·O·范德米拉科夫I·威德斯洛文
Owner ASML NETHERLANDS BV