Photosensitive coloring composition, cured film, method for forming pattern, color filter, solid-state imaging element and image display device
A coloring composition and photosensitivity technology, which is applied in the fields of electric solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problem of low heat resistance, and achieve the effect of excellent adhesion and rectangularity
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preparation example Construction
[0312]
[0313] The photosensitive coloring composition of this invention can mix and prepare the said component. When preparing the photosensitive coloring composition, all the components can be dissolved and / or dispersed in the solvent at the same time to prepare the photosensitive coloring composition, and each component can also be properly used as two or more kinds of solutions or dispersions according to needs, And these are mixed at the time of use (at the time of coating), and the photosensitive coloring composition is prepared.
[0314]Moreover, when preparing the photosensitive coloring composition containing a pigment, it is also preferable that it is the process of dispersing a pigment, when preparing a photosensitive coloring composition. In the step of dispersing the pigment, compression, extrusion, impact, shearing, cavitation, etc. are mentioned as the mechanical force used in the dispersion of the pigment. Specific examples of these steps include bead mills...
Embodiment 1
[0354] After mixing and stirring the raw materials shown below, it filtered with the nylon filter (manufactured by NIHONPALL LTD.) with a pore diameter of 0.45 micrometers, and the photosensitive coloring composition was prepared.
[0355] ·Pigment dispersion (G1)...72.5 parts by mass
[0356] ・Photopolymerization initiator a (initiator 1)...1.16 parts by mass
[0357] ・Photopolymerization initiator b (initiator 4)...0.87 parts by mass
[0358] 40% by mass propylene glycol monomethyl ether acetate solution of alkali-soluble resin (resin A) ... 6.31 parts by mass
[0359] ・Polymerizable monomer (M1)...4.77 parts by mass
[0360] Inhibitor (p-methoxyphenol)...0.002 parts by mass
[0361] Surfactant (1% by mass propylene glycol monomethyl ether acetate solution of a compound of the following structure (Mw=14000, the value of % representing the ratio of the repeating unit is mol%)) ... 0.83 parts by mass
[0362] [chemical formula 20]
[0363]
[0364] Propylene glycol mon...
Embodiment 2~18、 comparative example 1~3
[0366] A photosensitive coloring composition was prepared in the same manner as in Example 1 by changing the type of pigment dispersion liquid, the type and content of the photopolymerization initiator, and the type and content of the polymerizable monomer as described in the following table. In addition, the numerical value of content described in the content column of the polymerizable monomer of the following table|surface is content in the total solid content of a photosensitive coloring composition. In addition, regarding Example 10, the blending amount R1 of the pigment dispersion liquid was set to 79.5 parts by mass. In addition, regarding Example 11, the compounding amount B1 of the pigment dispersion liquid was set to 68.4 parts by mass.
[0367] [Table 1]
[0368]
[0369] The raw materials described in the above table are as follows.
[0370] (pigment dispersion)
[0371] G1: Pigment dispersion prepared by the following method
[0372] Propylene glycol monome...
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Abstract
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