Chemical plating solution and method for reducing chemical plating layer roughness in LDS process and chemical plating roller
A chemical plating solution and roughness technology, applied in liquid chemical plating, metal material coating process, coating, etc., can solve problems such as dropout, increased product thickness, and bondline dropout
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[0034] see figure 2 Shown, the present invention provides a kind of method reducing the roughness of electroless coating in LDS technology, comprises the steps:
[0035] Provide a substrate, the substrate is an LDS substrate;
[0036] Laser activation treatment, using LDS technology to perform laser activation on the surface of the substrate to obtain a conductive region;
[0037] Electroless plating, the laser-activated substrate to be plated is placed in a drum filled with chemical plating solution to form a chemical plating layer in the conductive area. Abrasive particles 1 are added to the chemical plating solution, and the chemical plating layer is polished at the same time to reduce the chemical plating layer. surface roughness.
[0038] On the basis of the prior art, a method for reducing the roughness of the electroless coating in the LDS process provided by the invention mainly improves the electroless plating step, see image 3 as shown, image 3 It is a schemat...
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