47 results about "Electroless coating" patented technology

A material for forming electroless plate comprising a non-conductive base material and a catalyst adhering layer provided on the non-conductive base material is constituted so that the catalyst adhering layer should comprise a hydrophilic (meth)acrylic resin constituted with a hydrophilic monomer and a hydrophobic monomer and containing the hydrophobic monomer at a ratio of 50 to 90 mol %. This material for forming electroless plate shows favorable catalyst adhering property, and shows no delamination of the catalyst adhering layer from the non-conductive base material, no dissolution of the catalyst adhering layer into a plating solution, and no discoloration of plate layer during the catalyst adhering step, development step and other steps.

Provided is a semiconductor element including: a front-back conduction-type substrate including a front-side electrode and a back-side electrode; and an electroless plating layer formed on at least one of the electrodes of the front-back conduction-type substrate. The electroless plating layer includes: an electroless nickel-phosphorus plating layer; and an electroless gold plating layer formed on the electroless nickel-phosphorus plating layer, and has a plurality of recesses formed on a surface thereof to be joined with solder.

A method for plating a work piece. An electroless layer of material is applied to the work piece using an electroless plating process. The method includes creating a barrier in electrical conductivity in the work piece to divide the work piece into a first segment and a second segment which are substantially electrically insulated from one another, prior to electroplating the work piece. A plurality of methods are disclosed for dividing the work piece into the first and second segments.

Provided are a magnetic disk and a method of fabricating the magnetic disk. The magnetic disk includes an aluminum alloy plate fabricated by a process involving a CC method and a compound removal process, and an electroless Ni—P plating layer disposed on the surface of the plate. The aluminum alloy plate is composed of an aluminum alloy containing 0.4 to 3.0 mass % (hereinafter abbreviated simply as “%”) of Fe, 0.1% to 3.0% of Mn, 0.005% to 1.000% of Cu, 0.005% to 1.000% of Zn, with a balance of Al and unavoidable impurities. In the magnetic disk, the maximum amplitude of waviness in a wavelength range of 0.4 to 5.0 mm is 5 nm or less, and the maximum amplitude of waviness in a wavelength range of 0.08 to 0.45 mm is 1.5 nm or less.

A semiconductor device including: a semiconductor element; and a first electrode formed on a first surface of the semiconductor element. The first electrode has a stacked structure including a first electroless Ni plating layer. The first electroless Ni plating layer contains nickel (Ni) and phosphorus (P) as a composition. A phosphorus (P) concentration of the first electroless Ni plating layer is 2.5 wt % to 6 wt % inclusive, and a crystallization rate of Ni3P in the first electroless Ni plating layer is 0% to 20% inclusive.

The invention discloses a silver-based circuit board with electroless nickel-palladium-gold plating and a preparation method thereof. The silver-based circuit board includes a silver-based substrate, and the surface of the silver-based substrate is sequentially plated with a nickel layer, Palladium layer, gold layer. The preparation method includes the following steps: performing micro-etching, pickling, pre-dipping, palladium activation, and post-dipping pre-treatment on the cleaned silver-based substrate in sequence, and then performing pre-treatment on the pre-treated silver-based substrate in sequence. Electroless nickel plating, electroless palladium plating, and electroless gold plating are silver-based circuit boards containing nickel-palladium-gold coating. Compared with traditional copper-based electroless nickel-palladium-gold plating, the thickness of nickel-palladium-gold electroless plating can be greatly reduced, thereby saving The use content of metals, while avoiding the problem of pollution to the environment. Furthermore, with the silver base as the base, the entire product has stronger electrical and thermal conductivity, higher sensitivity, longer life, and better overall performance.

Provided is a plating lamination technology for providing a highly adhesive inner layer of a printed circuit board. The plating lamination technology is effective in providing an electroless plated laminate, including a non-etched / low-roughness pretreated laminate or a low-roughness copper foil, and a printed circuit board including the plated laminate.