The invention discloses a PVD (
Physical Vapor Deposition) film on an electronic product
metal surface and a preparation method of the PVD film. The PVD film comprises a
metal base material, wherein a plurality
layers of
metal or metal compound films are deposited on the surface of the metal base material; the thickness of the film is 0.1-3mu m; the preparation method comprises the following steps of: selecting a product to be machined as the base material; carrying out pretreatment;
coating the film on the base material which is subjected to pretreatment by using a magnetron
sputtering machine, namely, firstly, baking the base material at 120-200 DEG C, secondly, carrying out
ion cleaning on the base material in the
vacuum state greater than 7*10<-3>Pa, wherein the cleaning time is set as 5-10 minutes, and the vacuum degree in
ion cleaning is reduced to be about 7*10<-1>Pa; after the
ion cleaning is accomplished, and
coating the film on the base material in the
vacuum state of 6.4*10<-3>Pa, wherein the vacuum degree in
coating the film is reduced to be about 2.3*10<-1>Pa. Colors can be coated on the metal surface, such as a golden yellow series, a dark series, silver, coffee,
tarnish, a blue series, a purple series and the like; the film
layers are
solid; the color is variable; in-
batch production can be conducted.