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Chemical filter

A technology of chemical filter and unit body, which is applied in the direction of gravity filter, chemical instrument and method, filtration and separation, etc., which can solve the problem that the optical processing of the substrate cannot be carried out smoothly, and achieve the effect of maintaining purity

Inactive Publication Date: 2002-07-10
NITTA CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

That is, the exposed lens with rust on it cannot be focused in a minimally optimized state as the fine pattern is improved, and the optical processing of the substrate cannot be performed smoothly

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0046] The unit body 10 was treated in the same manner as in Comparative Example 2, except that it was baked at 150° C. instead of 50° C. for 30 minutes.

Embodiment 2

[0048] The unit body 10 was treated in the same manner as in Comparative Example 2, except that it was ultrasonically cleaned with IPA and then demineralized water, and dried at 200° C. for 30 minutes. [B] Air leakage measurement of Comparative Examples 1 and 2 and Examples 1 and 2

[0049] Air leakage was measured as follows.

[0050] Each unit cell was placed in a SUS container and heated in an oven up to 50° C. while supplying 2 to 300 ml / min of pure air. The air was collected with a Tenax collection tube (using a packer for adsorbed gas, Tenax (trade mark) GR).

[0051] The collected air was condensed by a thermal desorption condensation injector (Model CP4020 manufactured by JL Science Inc.) and analyzed by a gas chromatography mass spectroscope GC-MS (Model MD800). From the area of ​​the chromatogram, the area was converted to the amount of toluene and determined. And the determined amount of toluene is divided by the sampled amount to calculate the concentration of air...

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Abstract

A chemical filter includes a unit body and an adsorbent housed in the unit body. The adsorbent is for adsorbing a gas. The chemical filter provides a purified gas in which the concentration of ammonia and the concentration of organic gases having a boiling point of about 150° C. or higher, respectively are about 1 ppb(v) or less. This purified gas is applicable for a semiconductor manufacturing system without causing troubles of tarnish and the like.

Description

technical field [0001] The present invention relates to an axial chemical filter for use in systems such as semiconductor manufacturing. Background technique [0002] Although a conventional chemical filter has been used in air lines of semiconductor manufacturing systems, very small amounts of gaseous pollutants tend to exist, mixed in purified air, nitrogen, etc. that have been dedusted by the chemical filter. [0003] As refinement of semiconductor patterns has been further improved, rusting, which occurs when very small amounts of gaseous contaminants adhere to exposed lenses of semiconductor manufacturing systems, has become a next-generation problem. That is, as fine patterns are improved, an exposed lens having rust thereon cannot be focused in a minimally optimized state, and optical processing of the substrate cannot be smoothly performed. Contents of the invention [0004] It is therefore an object of the present invention to provide a chemical filter which over...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D39/00B01D53/04H01L21/205
CPCB01D2253/102B01D2259/40084B01D2258/0216Y02C20/30B01D53/0415Y02P70/50B01D39/00
Inventor 东野伸幸山本宗弘住冈将行荒牧大
Owner NITTA CORP
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