Shield layer, method for producing shield layer, and oxide sputtering target
A manufacturing method and shielding layer technology, applied in sputtering plating, magnetic field/electric field shielding, coating, etc., can solve the problems of easy intrusion, resistance value and transmittance change, etc., and achieve excellent environmental resistance and high resistance value , the effect of high transmittance
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[0111] Hereinafter, the results of confirmation experiments conducted to confirm the effectiveness of the present invention will be described.
[0112]
[0113] As raw material powder, indium oxide powder (In 2 o 3 Powder: purity of 99.9% by mass or more, average particle size of 1 μm), silicon oxide powder (SiO 2 Powder: purity of 99.8 mass % or more, average particle size of 2 μm) and zirconium oxide powder (ZrO 2 Powder: a purity of 99.9% by mass or more, and an average particle diameter of 2 μm). And these were weighed so that it might become the compounding ratio shown in Table 1.
[0114] In addition, for zirconia powder (ZrO 2 Powder) purity, by measuring the Fe 2 o 3 , SiO 2 、TiO 2 、Na 2 O content, while the remainder is ZrO 2 Purity calculated when, sometimes containing up to 2.5% by mass of HfO 2 .
[0115] Each of the weighed raw material powders was put into a bead mill together with zirconia balls with a diameter of 0.5 mm as a grinding medium and a ...
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